Electro-optical device substrate, electro-optical device, electronic device, and projection display device

• US 6,373,544 B1
• Filed: 06/12/1998
• Issued: 04/16/2002
• Est. Priority Date: 06/17/1997
• Status: Expired due to Term

• Current Assignee: Seiko Epson Corporation (Seiko Group)
• Original Assignee: Seiko Epson Corporation (Seiko Group)
• Inventors: Hirabayashi, Yukiya
• Primary Examiner(s): Sikes, William L.
• Assistant Examiner(s): CHOWDHURY, TARIFUR RASHID
• Application Number:
  US09/097,157
• Time in Patent Office: 1,404 Days
• Field of Search: 349/149, 349/153, 349/155, 349/138, 257/59, 257/72
• US Class Current: 349/149
• CPC Class Codes: G02F 1/133357 Planarisation layers
• CPC Class Codes: G02F 1/136209 Light shielding layers, e.g. black matrix, incorporated in the active matrix substrate, e.g. structurally associated with the switching element
• CPC Class Codes: G02F 1/136277 formed on a semiconductor substrate, e.g. of silicon
• CPC Class Codes: H01L 27/12 the substrate being other than a semiconductor body, e.g. an insulating body

Abstract

In a liquid crystal panel substrate having a layered film structure of interlayer insulation films and metal layers alternately formed on a semiconductor substrate provided with a transistor region for pixel selection thereon, to provide a configuration for achieving a uniform polishing rate without thickening of the interlayer insulation film to be polished. A liquid crystal panel substrate is provided with a shading film 12 composed of a second metal layer in a pixel region, a second interlayer insulation film 11 under the shading film, a wiring film 10 composed of a first metal layer under the second interlayer insulation film, a pixel electrode composed of a third metal layer on a third interlayer insulation film 13 on the shading film, and a connecting plug 15 connecting the wiring film 10 and the pixel electrode through an opening provided in the shading film 12. A lower dummy pattern A composed of the first metal layer and an upper dummy pattern B composed of the second metal layer are formed on the periphery of input terminal pads 26 in the non-pixel region. Since the surface level of the third interlayer insulation film 13 formed on the dummy patterns A and B is raised, excessive polishing is prevented at the position. As a result, a uniform polishing rate is achieved in CMP treatment.

Claims

1. An electro-optical device substrate having a non-pixel region, a pixel region and a sealing region on the periphery of said pixel region, said substrate comprising:

a layered film structure including a plurality of interlayer insulation films and a plurality of conductive layers alternately formed in said pixel region of said substrate, said plurality of conductive layers including a top conductive layer, at least one of said plurality of interlayer insulation films below said top conductive layer being polished; and

at least one of said plurality of conductive layers forming a plurality of dummy patterns below said polished interlayer insulation film and in said sealing region.

2. The electro-optical device substrate of claim 1, one of said plurality of conductive layers forming a control wiring layer for a plurality of switching elements and also forming said plurality of dummy patterns.

3. An electro-optical device comprising:

the electro-optical device substrate of claim 1;

a transparent substrate spaced from said electro-optical device substrate; and

an electro-optical material positioned between said electro-optical device substrate and said transparent substrate.

4. An electronic display device comprising the electro-optical device of claim 3.

5. A projection display device comprising a light valve using the electro-optical device of claim 3.

6. An electro-optical device substrate having a non-pixel region, a pixel region and a sealing region on the periphery of said pixel region, said sealing region having corner regions and side regions, said substrate comprising:

a layered film structure of a plurality of interlayer insulation films and a plurality of conductive layers alternately formed in said pixel region of said substrate, said plurality of conductive layers including a top conductive layer, at least one of said plurality of interlayer insulation films below said top conductive layer being polished; and

at least one of said plurality of conductive layers forming a plurality of dummy patterns below said polished interlayer insulation film and positioned in said corner regions, said plurality of dummy patterns having a lower distribution density in said corner regions than said side regions.

7. The electro-optical device substrate of claim 6, said corner regions having an interior and a periphery, said interior of said corner regions having a lower density distribution than said periphery.

8. The electro-optical device substrate of claim 6, said corner regions comprising upper right and left corner regions and lower right and left corner regions, said lower right and left corner regions having a lower density distribution than said upper right and left corner regions.

9. An electro-optical device comprising:

the electro-optical device substrate of claim 6;

a transparent substrate spaced from said electro-optical device substrate; and

an electro-optical material positioned between said electro-optical device substrate and said transparent substrate.

10. An electronic display device comprising the electro-optical device of claim 9.

11. A projection display device comprising a light valve using the electro-optical device of claim 9.

12. An electro-optical device substrate having a non-pixel region, a pixel region and a sealing region on the periphery of said pixel region, said sealing region having corner regions and side regions, said substrate comprising:

a layered film structure of a plurality of interlayer insulation films and a plurality of conductive layers alternately formed in said pixel region of said substrate, said plurality of conductive layers including a top conductive layer, at least one of said plurality of interlayer insulation films below said top conductive layer being polished; and

at least one of said plurality of conductive layers forming a plurality of dummy patterns below said polished interlayer insulation film and positioned in said corner regions, said plurality of dummy patterns having at least one vertical dummy pattern at a corresponding vertical side of said corner region and at least one horizontal dummy pattern at a corresponding horizontal side of said corner region.

13. An electro-optical device comprising:

the electro-optical device substrate of claim 12;

a transparent substrate spaced from said electro-optical device substrate; and

an electro-optical material positioned between said electro-optical device substrate and said transparent substrate.

14. An electronic display device comprising the electro-optical device of claim 13.

15. A projection display device comprising a light valve using the electro-optical device of claim 13.

16. An electro-optical device substrate having a non-pixel region, a pixel region and a sealing region on the periphery of said pixel region, said sealing region having corner regions, said substrate comprising:

a layered film structure including a plurality of interlayer insulation films and a plurality of conductive layers alternately formed in said pixel region of said substrate, said plurality of conductive layers including a top conductive layer, at least one of said plurality of said interlayer insulation films below said top conductive layer being polished; and

at least one of said plurality of conductive layers forming a plurality of dummy patterns below said polished interlayer insulation film and in said sealing region, excluding said corner region.

17. An electro-optical device comprising:

the electro-optical device substrate of claim 16;

a transparent substrate spaced from said electro-optical device substrate; and

an electro-optical material positioned between said electro-optical device substrate and said transparent substrate.

18. An electronic display device comprising the electro-optical device of claim 17.

19. A projection display device comprising a light valve using the electro-optical device of claim 17.

20. An electro-optical device substrate having a non-pixel region and pixels in a pixel region, said substrate comprising:

a layered film structure including a plurality of interlayer insulation films and a plurality of conductive layers alternately formed in said pixel region of said substrate, said plurality of conductive layers including a top conductive layer, at least one of said plurality of said interlayer insulation films below said top conductive layer being polished;

a plurality of terminal pads formed in said non-pixel region; and

a plurality of switching elements each corresponding to one of said pixels in said pixel region, at least one of said plurality of conductive layers forming a plurality of uneven pseudo pixel patterns positioned in said non-pixel region for eliminating a gap between said pixel region and said non-pixel region.

21. The electro-optical device substrate of claim 20, the plurality of uneven pseudo pixel patterns comprising a two-dimensional array of uneven pseudo pixel patterns.

22. The electro-optical device substrate of claim 20, said plurality of conductive layers further comprising:

a first conductive layer electrically connected to said top conductive layer; and

a second conductive layer between said first conductive layer and said top conductive layer, one of said first conductive layer and said second conductive layer including a first dummy pattern of said plurality of uneven pseudo pixel patterns.

23. The electro-optical device substrate of claim 22, the other of said first conductive layer and said second conductive layer including a second dummy pattern of said plurality of uneven pseudo pixel patterns.

24. The electro-optical device substrate of claim 20, each of said plurality of uneven pseudo pixel patterns comprising a pseudo gate line and a pseudo data line.

25. An electro-optical device comprising:

the electro-optical device substrate of claim 20;

a transparent substrate spaced from said electro-optical device substrate; and

an electro-optical material positioned between said electro-optical device substrate and said transparent substrate.

26. An electronic display device comprising the electro-optical device of claim 25.

27. A projection display device comprising a light valve using the electro-optical device of claim 25.