Magnetron with parallel race track and modified end portions thereof
First Claim
1. A sputtering magnetron with a rotating cylindrical target and a stationary magnet assembly, said magnet assembly being adapted to produce an elongate plasma race-track on a surface of said target, said elongate race-track having substantially parallel tracks over a substantial portion of its length and being closed at each end by end portions, wherein each end portion of the plasma race-track is representable substantially by an ellipse and a spacing between the tracks of said race-track across said ellipse in a first direction perpendicular to a longitudinal axis of the elongate racetrack is larger than the distance between the substantially parallel tracks along a direction parallel to the first direction to materially effect sputtering onto a substrate.
2 Assignments
0 Petitions
Accused Products
Abstract
A sputtering magnetron with a rotating cylindrical target and a stationary magnet assembly (22, 24*) is described, the magnet assembly (22, 24*) being adapted to produce an elongate plasma race-track on the surface of the target, the elongate race-track having substantially parallel tracks over a substantial portion of its length and being closed at each end by end portions (22′), wherein the spacing between the tracks of the race-track is increased locally to materially effect sputtering onto a substrate. The increase in spacing may be at the end portions or along the parallel track portion. The increase in spacing may provide more even erosion of the target beneath the end portions of the race-track, and provide more even coatings on the substrate.
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Citations
10 Claims
- 1. A sputtering magnetron with a rotating cylindrical target and a stationary magnet assembly, said magnet assembly being adapted to produce an elongate plasma race-track on a surface of said target, said elongate race-track having substantially parallel tracks over a substantial portion of its length and being closed at each end by end portions, wherein each end portion of the plasma race-track is representable substantially by an ellipse and a spacing between the tracks of said race-track across said ellipse in a first direction perpendicular to a longitudinal axis of the elongate racetrack is larger than the distance between the substantially parallel tracks along a direction parallel to the first direction to materially effect sputtering onto a substrate.
Specification