Magnetron with parallel race track and modified end portions thereof

• US 6,375,814 B1
• Filed: 02/12/2001
• Issued: 04/23/2002
• Est. Priority Date: 04/16/1998
• Status: Expired due to Fees

• Current Assignee: Bekaert Advanced Coatings NV (Soleras Advanced Coatings BVBA)
• Original Assignee: Sinvaco N.V.
• Inventors: Lievens, Hugo, De Bosscher, Wilmert
• Primary Examiner(s): Nguyen, Nam
• Assistant Examiner(s): Cantelmo, Gregg
• Application Number:
  US09/673,176
• Time in Patent Office: 435 Days
• Field of Search: 204/298.21, 204/298.22
• US Class Current: 204/298.21
• CPC Class Codes: H01J 37/3405 Magnetron sputtering

Abstract

A sputtering magnetron with a rotating cylindrical target and a stationary magnet assembly (22, 24*) is described, the magnet assembly (22, 24*) being adapted to produce an elongate plasma race-track on the surface of the target, the elongate race-track having substantially parallel tracks over a substantial portion of its length and being closed at each end by end portions (22′), wherein the spacing between the tracks of the race-track is increased locally to materially effect sputtering onto a substrate. The increase in spacing may be at the end portions or along the parallel track portion. The increase in spacing may provide more even erosion of the target beneath the end portions of the race-track, and provide more even coatings on the substrate.

Claims

1. A sputtering magnetron with a rotating cylindrical target and a stationary magnet assembly, said magnet assembly being adapted to produce an elongate plasma race-track on a surface of said target, said elongate race-track having substantially parallel tracks over a substantial portion of its length and being closed at each end by end portions, wherein each end portion of the plasma race-track is representable substantially by an ellipse and a spacing between the tracks of said race-track across said ellipse in a first direction perpendicular to a longitudinal axis of the elongate racetrack is larger than the distance between the substantially parallel tracks along a direction parallel to the first direction to materially effect sputtering onto a substrate.

2. The magnetron according to claim 1, wherein said magnet assembly further comprises:

an elongated central section positioned within said cylindrical target and generating a magnetic field associated with a first magnetic polarity;

a peripheral section positioned within said cylindrical target and being arranged around said elongated central section such that spaces are defined between said peripheral section and said elongated central section, said peripheral section generating a magnetic field associated with a second magnetic polarity;

wherein said elongated central section and said peripheral section define a magnetic field suitable for enclosing said racetrack; and

wherein said magnetron further comprises;

means for causing relative rotation between the cylindrical target and said magnet assembly.

3. A magnetron according to claim 2 wherein the ellipse has a radius “

p” and

a radius “

r”

in the directions perpendicular and parallel to the first direction, respectively and a width of the track of the race-track in at least the middle of an end portion being represented by “

s”

, the dimensions “

s”

, “

p” and

“

r”

being chosen in a pre-determined relationship to each other in combination with the magnet field strengths and magnetic materials used in said central section and/or said peripheral section of the magnet assembly and the distance between the central and/or the peripheral section and the target to render the target erosion in the end portions substantially uniform.

4. A magnetron according to claim 3 wherein the width of the erosion groove caused by the race-track in the target is less than 1.5r.

5. A magnetron according to claim 3 wherein the ratio p/r is defined by 0.2≦

p/r≦

2, more preferably 0.4≦

p/r≦

1.75 and most preferably 0.6≦

p/r≦

1.2.

6. A magnetron according to claim 3, wherein the width of the erosion groove caused by the race-track in the target is less than 1.2r.

7. A magnetron according to claim 3, wherein an erosion depth of the target in the peripheral section is between +20% and 0% more than an erosion depth of the target in the central section.

8. A magnetron according to claim 1 wherein the spacing between the tracks in the portion of the race-track having parallel tracks is varied locally.

9. A magnetron according to claim 8, wherein the spacing is varied so that a portion of material sputtered from the target is sputtered onto a further rotating cylindrical target located adjacent to said rotating cylindrical target.

10. A magnetron according to any of the claim 2 wherein one of the central and peripheral sections includes at least one magnet and the other of the central and peripheral sections includes a soft magnetic material forming a magnetic circuit with said magnet.