Silicon dioxide deposition by plasma activated evaporation process
First Claim
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1. A method for coating a plastic substrate with an abrasion resistant metal oxide layer which comprises:
- placing the plastic substrate in a vacuum chamber, conducting electron beam evaporation of an oxide-forming metal or a metal oxide in the vacuum chamber, passing the oxide-forming metal into an argon plasma into which nitrous oxide has been passed, and exposing the plastic substrate to the plasma, whereby the abrasion resistant layer is deposited on an exposed surface of the substrate.
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Abstract
A method for coating a plastic substrate with an abrasion resistant metal oxide layer which includes placing the plastic substrate in a vacuum chamber, forming a vacuum in the chamber, conducting electron beam evaporation of an oxide-forming metal or a metal oxide in the vacuum chamber, passing the evaporated metal or metal oxide into an argon plasma into which oxygen and nitrous oxide has been passed, and, exposing the plastic substrate to the plasma, whereby the abrasion resistant layer is deposited on an exposed surface of the substrate.
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Citations
6 Claims
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1. A method for coating a plastic substrate with an abrasion resistant metal oxide layer which comprises:
- placing the plastic substrate in a vacuum chamber, conducting electron beam evaporation of an oxide-forming metal or a metal oxide in the vacuum chamber, passing the oxide-forming metal into an argon plasma into which nitrous oxide has been passed, and exposing the plastic substrate to the plasma, whereby the abrasion resistant layer is deposited on an exposed surface of the substrate.
- View Dependent Claims (2, 3, 4, 5, 6)
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Current AssigneeSabic Innovative Plastics IP BV (Government of Saudi Arabia)
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Original AssigneeGeneral Electric Company
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InventorsIacovangelo, Charles Dominic
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Primary Examiner(s)CHEN, BRET P
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Application NumberUS09/354,258Time in Patent Office1,020 DaysField of Search427/567, 427/574, 427/578, 427/579, 427/551, 427/576, 427/597US Class Current427/576CPC Class CodesC23C 14/10 Glass or silicaC23C 14/32 by explosion; by evaporatio...
