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Moving exposure system and method for maskless lithography system

  • US 6,379,867 B1
  • Filed: 01/10/2000
  • Issued: 04/30/2002
  • Est. Priority Date: 01/10/2000
  • Status: Expired due to Term
First Claim
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1. A method for projecting a pixel-mask pattern onto a subject, the method comprising the steps of:

  • dividing the subject into a plurality of sites, with each site comprising a plurality of groups of pixel-sites;

    dividing the pixel-mask pattern into a plurality of sub-patterns, each sub-pattern being directed to a specific group of pixel-sites in the plurality of sites;

    providing one of the sub-patterns to a pixel panel for creating a plurality of pixel elements by selectively manipulating the pixel panel responsive to the provided sub-pattern;

    simultaneously focusing the plurality of pixel elements to discrete, non-contiguous pixel sites;

    simultaneously moving the plurality of pixel elements relative to the subject; and

    providing a next one of the sub-patterns to the pixel panel responsive to the movement and responsive to the pixel-mask pattern, so that a first pixel site of a group receives a first value and a second pixel site of the same group receives a second value different from the first value.

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