Mask holding device, exposure apparatus and device manufacturing method

• US 6,381,005 B1
• Filed: 04/28/1998
• Issued: 04/30/2002
• Est. Priority Date: 05/09/1997
• Status: Expired due to Fees

• Current Assignee: Canon Kabushiki Kaisha (Canon Inc.)
• Original Assignee: Canon Kabushiki Kaisha (Canon Inc.)
• Inventors: Miyachi, Takeshi, Kasumi, Kazuyuki
• Primary Examiner(s): Adams, Russell
• Assistant Examiner(s): Kim, Peter B.
• Application Number:
  US09/066,836
• Time in Patent Office: 1,463 Days
• Field of Search: 355/75, 414/751, 378/34, 378/208, 250/548, 356/399, 356/400, 356/401
• US Class Current: 355/75
• CPC Class Codes: G03F 7/707 Chucks, e.g. chucking or un-chucking operations or structural details
• CPC Class Codes: G03F 7/70783 Handling stress or warp of chucks, masks or workpieces, e.g. to compensate for imaging errors or considerations related to warpage of masks or workpieces due to their own weight

Abstract

An exposure device for transferring a pattern on a mask onto a wafer. The exposure device includes a frame for supporting the mask, a mask holding device including a correction mechanism for correcting the pattern on the mask by applying force to the mask frame, and a device for changing at least one of the attitude and position of the correction mechanism, in accordance with the attitude of the mask. The positional relationship between the correction mechanism and the mask does not vary even if the attitude of the mask is changed to adjust the exposure gap between the wafer and the mask. Accordingly, the amount of change in magnification to be corrected can be kept constant and precise magnification correction can be achieved.

Claims

1. A mask holding device comprising:

a mask stage having a mask chuck for chucking a mask, said mask stage changing an attitude of the mask; and

a correction mechanism for correcting a pattern on a mask membrane of the mask by applying force to a frame which supports the mask after the mask is chucked by the mask chuck on said mask stage, wherein said correction mechanism is mounted on said mask stage.

2. An exposure apparatus for exposing a mask, having a pattern on a mask membrane, onto a substrate, placed a small distance apart, said exposure apparatus comprising:

a mask stage having a mask chuck for chucking the mask, said mask stage changing an attitude of the mask; and

a mask holding device including a correction mechanism for correcting the pattern by applying force to a frame which supports the mask after the mask is chucked by the mask chuck on said mask stage, wherein said correction mechanism is mounted on said mask stage.

3. An exposure apparatus according to claim 2, wherein the exposure is performed by using X-rays.

4. A device manufacturing method comprising the steps of:

placing a mask, having a pattern on a mask membrane, and a substrate a small distance apart;

chucking the mask using a mask stage having a mask chuck;

changing an attitude of the mask using the mask stage;

providing an exposure apparatus that includes a mask holding device having a correction mechanism, the correction mechanism being mounted on the mask stage;

correcting the pattern, using the correction mechanism, by applying force to a frame which supports the mask after the mask is chucked by the mask chuck on the mask stage; and

performing exposure using the exposure apparatus by exposing the substrate to the pattern on the mask, to manufacture a device.

5. A method according to claim 4, wherein the exposure is performed by using X-rays.

6. A mask holding device comprising:

a mask stage having a mask chuck for chucking a mask, said mask stage changing an attitude of the mask in a tilt direction; and

a correction mechanism, mounted on said mask stage, for correcting a pattern on a mask membrane of the mask by applying force to a frame which supports the mask after the mask is chucked by the mask chuck on said mask stage.

7. A mask holding device according to claim 6, wherein said correction mechanism applies the force continually during an exposure operation.

8. An exposure apparatus for exposing a mask, having a pattern on a mask membrane, onto a substrate, placed a small distance apart, said exposure apparatus comprising:

a mask stage having a mask chuck for chucking the mask, said mask stage changing an attitude of the mask in a tilt direction; and

a mask holding device including a correction mechanism, mounted on said mask stage, for correcting the pattern by applying force to a frame which supports the mask after the mask is chucked by the mask chuck on said mask stage.

9. An exposure apparatus according to claim 8, wherein said correction mechanism applies the force continually during an exposure operation.

10. A device manufacturing method comprising the steps of:

placing a mask, having a pattern on a mask membrane, and a substrate a small distance apart;

chucking the mask using a mask stage having a mask chuck;

changing an attitude of the mask in a tilt direction using the mask stage;

providing an exposure apparatus that includes a mask holding device having a correction mechanism, the correction mechanism being mounted on the mask stage;

correcting the pattern, using the correction mechanism, by applying force to a frame which supports the mask after the mask is chucked by the mask chuck on the mask stage; and

performing exposure using the exposure apparatus by exposing the substrate to the pattern on the mask, to manufacture a device.

11. A device manufacturing method according to claim 10, further comprising applying the force by the correction mechanism in said correcting step continually during exposure.