Substrate processing apparatus
First Claim
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1. A substrate processing apparatus, comprising:
- a centrally provided evacuable separation chamber having sides, a plurality of evacuable load lock chambers which are hermetically connected to the sides of the separation chamber via gate valves, a plurality of evacuable process chambers which are hermetically connected to the sides of the separation chamber via gate valves, and a transfer mechanism provided inside the separation chamber, the transfer mechanism removes a substrate from one of the load lock chambers, transfers it to one or more of the process chambers in a prescribed sequence, and then returns it to one of the load lock chambers, the load lock chambers are stacked up in at least one place around the periphery of said separation chamber, and each of the load lock chambers incorporates a substrate holder and holds only a single substrate.
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Abstract
Four load lock chambers 2, 2′, 2″, 2′″ and eight process chambers 101, 102, 103, 104, 105, 106, 107 and 108 are hermetically connected around the outside of a central separation chamber 3 via gate valves 5—both types of chambers being stacked up in two places—and each chamber is capable of being evacuated by its respective vacuum pump system 301, 201 and 100. A transfer mechanism 42 inside separation chamber 3 removes a substrate 9 from a load lock chamber 2, 2′, 2″, 2′″ transports it to each of the process chambers 101, 102, 103, 104, 105, 106, 107 and 108 in a prescribed sequence and thereafter returns it to load lock chamber 2, 2′, 2″, 2′″. Each load lock chamber 2 has inside it a substrate holder which always holds a single substrate 9 in the same position.
129 Citations
19 Claims
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1. A substrate processing apparatus, comprising:
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a centrally provided evacuable separation chamber having sides, a plurality of evacuable load lock chambers which are hermetically connected to the sides of the separation chamber via gate valves, a plurality of evacuable process chambers which are hermetically connected to the sides of the separation chamber via gate valves, and a transfer mechanism provided inside the separation chamber, the transfer mechanism removes a substrate from one of the load lock chambers, transfers it to one or more of the process chambers in a prescribed sequence, and then returns it to one of the load lock chambers, the load lock chambers are stacked up in at least one place around the periphery of said separation chamber, and each of the load lock chambers incorporates a substrate holder and holds only a single substrate. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15)
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16. A substrate processing apparatus, comprising:
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a centrally provided evacuable separation chamber having sides, a plurality of evacuable load lock chambers which are hermetically connected to the sides of the separation chamber via gate valves, a plurality of evacuable process chambers which are hermetically connected to the sides of the separation chamber via gate valves, a transfer mechanism provided inside the separation chamber, the transfer mechanism removes a substrate from one of the load lock chambers, transfers it to one or more of the process chambers in a prescribed sequence, and then returns it to one of the load lock chambers, the load lock chambers are stacked up in at least one place around the periphery of said separation chamber, each of the load lock chambers includes a dedicated vacuum pump system, and each of the load lock chambers incorporates a substrate holder and holds only a single substrate. - View Dependent Claims (17)
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18. A substrate processing apparatus, comprising:
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a centrally provided evacuable separation chamber having sides, a plurality of evacuable load lock chambers which are hermetically connected to the sides of the separation chamber via gate valves, a plurality of evacuable process chambers which are hermetically connected to the sides of the separation chamber via gate valves, wherein each of the gate valves is independently controllable, a transfer mechanism provided inside the separation chamber, the transfer mechanism removes a substrate from one of the load lock chambers, transfers it to one or more of the process chambers in a prescribed sequence, and then returns it to one of the load lock chambers, the load lock chambers are stacked up in at least one place around the periphery of said separation chamber, each of the load lock chambers includes a dedicated vacuum pump system, and each of the load lock chambers incorporates a substrate holder and holds only a single substrate. - View Dependent Claims (19)
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Specification
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Current AssigneeAnelva Corporation (Canon Inc.)
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Original AssigneeAnelva Corporation (Canon Inc.)
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InventorsKonishi, Akio, Takahashi, Nobuyuki
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Primary Examiner(s)Bratlie, Steven A.
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Application NumberUS09/450,710Time in Patent Office889 DaysField of Search414/217, 414/939US Class Current414/217CPC Class CodesH01L 21/67167 surrounding a central trans...H01L 21/67178 vertical arrangementH01L 21/6719 characterized by the constr...H01L 21/67201 characterized by the constr...Y10S 414/139 including wafer charging or...
