Protective member for inner surface of chamber and plasma processing apparatus

• US 6,383,333 B1
• Filed: 10/23/2000
• Issued: 05/07/2002
• Est. Priority Date: 04/28/1998
• Status: Expired due to Fees

• Current Assignee: Tokai Carbon Company Limited, Tokyo Electron Limited
• Original Assignee: Tokai Carbon Company Limited, Tokyo Electron Limited
• Inventors: Haino, Kazuyoshi, Kazama, Koichi
• Primary Examiner(s): Mills, Gregory
• Assistant Examiner(s): ALEJANDRO MULERO, LUZ L
• Application Number:
  US09/673,985
• Time in Patent Office: 561 Days
• Field of Search: 156/345, 118/723.R, 118/504, 118/723.MW, 118/723.MR, 118/723.MA, 118/723.ME, 118/723.E, 118/723.ER, 118/723.I, 118/723.IR, 118/723.AN, 204/298.11
• US Class Current: 156/345.1
• CPC Class Codes: H01J 37/32477 characterised by the means for protecting vessels or internal parts, e.g. coatings

Abstract

An inner wall protection member used to protect the inner wall of a chamber of a plasma treatment apparatus which can be used stably for a long period of time by specifying properties of glass-like carbon materials, and a plasma treatment apparatus provided with the protection member. The hollow protection member for protecting the inner wall of a plasma processing chamber is integrally formed of glass-like carbon materials with a volume resistivity of 1×10⁻² Ω·cm or less and a thermal conductivity of 5 W/m·K or more. The protection member preferably has a thickness of 4 mm or more and the average surface roughness (Ra) of the inside of the hollow structure is preferably 2.0 μm or less. The plasma processing apparatus is configured so that the inner wall protection member having the above characteristics is arranged along the inner wall of the chamber of the plasma processing apparatus, wherein the inner wall of the chamber and the protection member are electrically connected and the chamber is grounded.

Claims

1. A hollow protection member for protecting the inner wall of a plasma processing chamber of a plasma processing apparatus, which is integrally formed of glass-like carbon materials having a volume resistivity of 1×

10<sup>−

2</sup> Ω

·

cm or less and a thermal conductivity of 5 W/m·

K or more.

2. The protection member according to claim 1, having a thickness of 4 mm or more.

3. The protection member according to claim 1, of which the inner surface has average surface roughness (Ra) of 2.0 μ

m or less.

4. A plasma processing apparatus comprising a chamber and the inner wall protection member according to claim 1 which is arranged along the inner wall of the chamber, wherein the inner wall of the chamber and the protection member are electrically connected, with the chamber being grounded.

5. The plasma processing apparatus according to claim 4, wherein the inner wall of the chamber and the protection member are electrically connected at the bottom of the protection member.