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System for high power RF plasma processing

  • US 6,384,540 B1
  • Filed: 11/24/1999
  • Issued: 05/07/2002
  • Est. Priority Date: 02/24/1997
  • Status: Expired due to Term
First Claim
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1. A method of plasma processing comprising the steps of:

  • a) supplying a dc input having a potential;

    b) dividing said potential among a plurality of amplifiers each having a radio frequency output;

    c) supplying a radio frequency drive signal to each of said amplifiers;

    d) superimposing a variable dc level upon said radio frequency drive signal to form a combined signal;

    e) supplying said combined signal to said amplifiers;

    f) varying said dc level;

    g) combining said radio frequency outputs of said amplifiers to create at least one high power, radio frequency output;

    h) creating a plasma through action of said high power, radio frequency output; and

    i) processing using said plasma.

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