Method for exposing features on non-planar resists
First Claim
1. A method for imagewise exposing a non-planar resist layer, the method comprising:
- a) providing a variable focus optical system and a non-planar, layer of a non-integrating resist on a substrate;
b) illuminating selected areas on a surface of the resist layer a first time with the optical system at a first focus setting and thereby causing parts of the resist which are within the selected areas on the substrate and are at a first elevation to be converted from an unexposed state to an exposed state while not converting the resist in the selected areas at a second elevation; and
, c) illuminating the selected areas on the surface of the resist layer a second time with the optical system at a second focus setting and thereby causing parts of the resist which are within the selected areas on the substrate and are at the second elevation to be converted from the unexposed state to the exposed state.
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Abstract
A method for imaging a non-planar resist uses a non-integrating resist. The resist may be a thermoresist which changes from an unexposed state to an exposed state upon heating to a threshold temperature. The method involves using a variable focus optical system and making a plurality of exposures at different focus settings. The duration and intensity of the exposures is selected so that areas on the resist corresponding to in-focus features are heated to temperatures in excess of the threshold temperature and become exposed whereas areas on the resist corresponding to out-of-focus features are heated to temperatures which are insufficient to expose the resist.
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Citations
21 Claims
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1. A method for imagewise exposing a non-planar resist layer, the method comprising:
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a) providing a variable focus optical system and a non-planar, layer of a non-integrating resist on a substrate;
b) illuminating selected areas on a surface of the resist layer a first time with the optical system at a first focus setting and thereby causing parts of the resist which are within the selected areas on the substrate and are at a first elevation to be converted from an unexposed state to an exposed state while not converting the resist in the selected areas at a second elevation; and
,c) illuminating the selected areas on the surface of the resist layer a second time with the optical system at a second focus setting and thereby causing parts of the resist which are within the selected areas on the substrate and are at the second elevation to be converted from the unexposed state to the exposed state. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19)
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20. A method for imagewise exposing a non-planar resist layer, the method comprising:
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a) providing a variable focus optical system and a non-planar, layer of a non-integrating thermoresist on a substrate, the thermoresist changing from an unexposed state to an exposed state upon heating to a threshold temperature;
b) focusing the optical system to generate an in-focus image of a set of features in a first plane of focus of the optical system;
c) illuminating the set of features on a surface of the resist layer a first time for a duration sufficient to heat the illuminated portions of the resist which are in the first plane of focus to a temperature in excess of the threshold temperature at an intensity such that illuminated portions of the resist which are not in the first plane of focus are not heated to the threshold temperature;
d) focusing the optical system to generate an in-focus image of a set of features in a second plane of focus of the optical system; and
,e) illuminating the set of features on a surface of the resist layer a second time for a duration sufficient to heat the illuminated portions of the resist which are in the second plane of focus to a temperature in excess of the threshold temperature at an intensity such that illuminated portions of the resist which are not in the second plane of focus are not heated to the threshold temperature. - View Dependent Claims (21)
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Specification