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Apparatus and method of cleaning reticles for use in a lithography tool

  • US 6,387,602 B1
  • Filed: 02/15/2000
  • Issued: 05/14/2002
  • Est. Priority Date: 02/15/2000
  • Status: Expired due to Fees
First Claim
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1. A method of cleaning a reticle in a lithography tool comprising:

  • an illumination system constructed and arranged to supply a beam of light;

    a reticle exposure station constructed and arranged to hold a reticle comprising a circuit pattern serving to pattern the beam of light according to the circuit pattern;

    a wafer stage for holding a wafer;

    a projection system constructed and arranged to project the patterned beam of light onto the wafer;

    a reticle storage area constructed and arranged to store a plurality of reticles;

    a reticle cleaning station comprising an oxygen-containing environment, an ultraviolet light source constructed and arranged to generate ultraviolet rays and a reticle holding member; and

    a robot constructed and arranged to transfer the reticle from each one of the reticle exposure station, the reticle storage area and the reticle cleaning station, wherein the method comprises the steps of;

    retrieving a first reticle from one of said reticle exposure station and said reticle storage area using the robot;

    transporting the first reticle to the reticle cleaning station;

    irradiating the first reticle with the ultraviolet rays in an oxygen-containing atmosphere, while contemporaneously permitting the lithographic tool to perform exposure of a second reticle; and

    transferring the first reticle to one of said reticle exposure station and said reticle storage area using the robot.

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