Integrated monolithic microfabricated electrospray and liquid chromatography system and method
First Claim
1. A process for fabricating a chemical separation device, comprising:
- providing a silicon substrate; and
forming, by reactive-ion etching, a channel recessed into a major surface of said substrate, said channel having a plurality of posts, wherein said posts extend from and perpendicular to a bottom of said channel.
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Abstract
An electrospray device, a liquid chromatography device and an electrosprayliquid chromatography system are disclosed. The electrospray device comprises a substrate defining a channel between an entrance orifice on an injection surface and an exit orifice on an ejection surface, a nozzle defined by a portion recessed from the ejection surface surrounding the exit orifice, and an electrode for application of an electric potential to the substrate to optimize and generate an electrospray; and, optionally, additional electrode(s) to further modify the electrospray. The liquid chromatography device comprises a separation substrate defining an introduction channel between an entrance orifice and a reservoir and a separation channel between the reservoir and an exit orifice, the separation channel being populated with separation posts perpendicular to the fluid flow; a cover substrate bonded to the separation substrate to enclose the reservoir and the separation channel adjacent the cover substrate; and, optionally, electrode(s) for application of a electric potential to the fluid. The exit orifice of the liquid chromatography device may be homogeneously interfaced with the entrance orifice of the electrospray device to form an integrated single system. An array of multiple systems may-be fabricated in a single monolithic chip for rapid sequential fluid processing and generation of electrospray for subsequent analysis, such as by positioning the exit orifices of the electrospray devices near the sampling orifice of a mass spectrometer.
126 Citations
11 Claims
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1. A process for fabricating a chemical separation device, comprising:
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providing a silicon substrate; and
forming, by reactive-ion etching, a channel recessed into a major surface of said substrate, said channel having a plurality of posts, wherein said posts extend from and perpendicular to a bottom of said channel. - View Dependent Claims (2, 3, 4, 5, 6)
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7. A process for fabricating a chemical separation system, comprising:
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providing a first substrate having a first surface;
forming, at least in part by reactive-ion etching, a channel extending into said substrate from said first surface;
forming, at least in part by reactive-ion etching, a plurality of posts from said substrate, said posts being contained within said channel, perpendicular to a bottom of said channel and extending from said bottom of said channel to said first surface;
providing a second substrate; and
attaching said second substrate to said first surface of said first substrate to cover at least a portion of said channel. said substrate, said posts being contained within said channel, perpendicular to a bottom of said channel and extending from said bottom of said channel to said first surface;
providing a second substrate; and
attaching said second substrate to said first surface of said first substrate to cover at least a portion of said channel. - View Dependent Claims (8, 9, 10, 11)
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Specification