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Methods for forming metal oxide layers with enhanced purity

  • US 6,395,650 B1
  • Filed: 10/23/2000
  • Issued: 05/28/2002
  • Est. Priority Date: 10/23/2000
  • Status: Expired due to Fees
First Claim
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1. A method for purifying a metal oxide layer comprising:

  • providing a substrate having formed thereover a metal oxide layer, the metal oxide layer being formed of a metal oxide base material having incorporated and uniformly distributed therein a concentration of a contaminant material susceptible to reaction with an oxidant to form a volatile contaminant material;

    positioning the substrate within a reactor chamber;

    introducing into the reactor chamber the oxidant;

    irradiating within the reactor chamber the metal oxide layer and the oxidant with a radiation source such as to reduce within the metal oxide base material the concentration of the contaminant material and thus form from the metal oxide layer a purified metal oxide layer.

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