×

Thin film transistor having lightly doped regions

  • US 6,399,988 B1
  • Filed: 03/22/2000
  • Issued: 06/04/2002
  • Est. Priority Date: 03/26/1999
  • Status: Expired due to Term
First Claim
Patent Images

1. A semiconductor device comprising a pixel portion and a driver circuit for driving said pixel portion formed over a same substrate, said pixel portion comprising:

  • an n-channel type thin film transistor over said substrate, said n-channel type thin film transistor comprising;

    a semiconductor layer having at least a source region, a drain region, a channel forming region, and a lightly doped region; and

    a gate electrode adjacent to said channel forming region with a gate insulating film interposed therebetween, wherein said lightly doped region is disposed so as not to overlap said insulating gate electrode, and an offset region is formed between said channel forming region and said lightly doped region, and said driver circuit comprising;

    a first and a second n-channel type thin film transistors over said substrate, each of said first and said second n-channel type thin film transistors comprising;

    a semiconductor layer having at least a source region, a drain region, a channel forming region, and a lightly doped region; and

    a gate electrode adjacent to said channel forming region with a gate insulating film interposed therebetween, wherein said lightly doped region of said first n-channel type thin film transistor is disposed so as to overlap said gate electrode of said first n-channel type thin film transistor, wherein said lightly doped region of said second n-channel type thin film transistor is disposed so as to at least partly overlap said gate electrode of said second n-channel type thin film transistor.

View all claims
  • 1 Assignment
Timeline View
Assignment View
    ×
    ×