Method and apparatus for vaporizing liquid precursors and system for using same

• US 6,402,126 B2
• Filed: 05/16/2001
• Issued: 06/11/2002
• Est. Priority Date: 10/02/1996
• Status: Expired due to Fees

• Current Assignee: Micron Technology, Inc.
• Original Assignee: Micron Technology, Inc.
• Inventors: Atwell, David, Vaartstra, Brian A.
• Primary Examiner(s): Bueker, Richard
• Application Number:
  US09/858,753
• Publication Number:
  US 20010020448A1
• Time in Patent Office: 391 Days
• Field of Search: 118/726, 118/708, 118/712, 261/141, 261/142, 261/115, 392/396, 392/397, 392/398, 392/399, 427/248.1
• US Class Current: 261/141
• CPC Class Codes: C23C 16/4486 by producing an aerosol and subsequent evaporation of the droplets or particles

Abstract

A vaporizing apparatus and method for providing a vaporized liquid precursor to a process chamber in a vapor deposition process includes a microdroplet forming device for generating microdroplets from a liquid precursor and a heated housing defining a vaporization zone having a vapor flow path from the microdroplet forming device to the process chamber. The vaporization zone receives the microdroplets and a heated carrier gas. The heated carrier gas has a temperature so as to provide the primary source of heat for vaporizing the microdroplets. The vaporized liquid precursor is then directed to the process chamber from the heated vaporization zone.

Claims

1. A vaporizing apparatus for providing a vaporized liquid precursor to a process chamber in a vapor deposition process, the apparatus comprising:

a microdroplet forming device configured to generate microdroplets from a liquid precursor;

a heated housing defining a vaporization zone having a vapor flow path from the microdroplet forming device to the process chamber, the vaporization zone for receiving the microdroplets and a heated carrier gas, the heated carrier gas for vaporizing at least a portion of the microdroplets; and

a detector for detecting undesired particulates in the vapor flow path.

2. The apparatus according to claim 1, wherein the heated carrier gas is an inert gas with high thermal conductivity.

3. The apparatus according to claim 2, wherein the heated carrier gas is helium.

4. The apparatus according to claim 1, wherein the microdroplet forming device comprises a dispensing device sealingly positioned in the vaporization zone to dispense the microdroplets into the vaporization zone, the heated housing having a carrier gas port for receiving the heated carrier gas to vaporize the microdroplets in the vaporization zone, and further wherein the heated housing includes a directing device to direct the vaporized microdroplets into the process chamber.

5. The apparatus according to claim 4, wherein the apparatus further comprises:

a gas flow controller for controlling a flow rate of the heated carrier gas to the vaporization zone, the heated carrier gas being provided to the vaporization zone through a heated gas line connected to the carrier gas port; and

a liquid flow controller for providing the liquid precursor to the microdroplet forming device at a desired flow rate.

6. The apparatus according to claim 4, wherein the dispensing device comprises an opening for dispensing the microdroplets, the opening being positioned in close proximity to the carrier gas port.

7. The apparatus according to claim 1, wherein the microdroplets formed comprise droplets having a diameter of less than 1000 micrometers.

8. The apparatus according to claim 1, wherein the microdroplet forming device preheats the microdroplets prior to being introduced into the vaporization zone.

9. The apparatus according to claim 1, wherein the vaporization zone is physically separate from the process chamber.

10. The apparatus according to claim 9, wherein the vaporization zone is located at least in part within the process chamber but is physically separate therefrom.

11. The apparatus according to claim 1, wherein the heated housing comprises at least one wall, the at least one wall being heated by at least one heating element to maintain a substantially constant temperature along the vapor flow path.

12. The apparatus according to claim 11, wherein the apparatus comprises at least one monitor for detecting the temperature along the vapor flow path, the at least one heating element changing the temperature of the vapor flow path in response to the detected temperature.

13. The apparatus according to claim 1, wherein the microdroplet forming device comprises one of an electrostatic sprayer and an ultrasonic nebulizer.

14. A method of vaporizing liquid precursors for vapor deposition processes, the method comprising:

generating microdroplets;

vaporizing at least a portion of the microdroplets using a heated carrier gas; and

detecting undesired particulates in the vaporized microdroplets.

15. The method according to claim 14, wherein the heated carrier gas is an inert gas with high thermal conductivity.

16. The method according to claim 15, wherein the heated carrier gas is helium.

17. The method according to claim 14, wherein generating microdroplets comprises generating microdroplets electrostatically.

18. The method according to claim 14, wherein generating microdroplets comprises generating microdroplets ultrasonically.

19. The method according to claim 14, wherein generating microdroplets comprises generating microdroplets having a diameter less than about 1000 micrometers.

20. The method according to claim 14, wherein generating microdroplets comprises dispensing the microdroplets in a heated vaporization zone;

and further wherein vaporizing at least the portion of the microdroplets includes mixing the heated carrier gas with the microdroplets in the heated vaporization zone.

21. The method according to claim 20, wherein vaporizing at least the portion of the microdroplets further comprises providing the heated carrier gas to the heated vaporization zone at a flow rate to substantially prevent decomposition of the microdroplets at heated walls defining the heated vaporization zone.

22. The method according to claim 20, wherein vaporizing at least the portion of the microdroplets includes maintaining a substantially constant temperature of a mixture of the heated carrier gas and the microdroplets throughout the heated vaporization zone.

23. The method according to claim 20, further comprising directing a mixture of the heated carrier gas and vaporized microdroplets in the heated vaporization zone to one or more process chambers having a deposition surface positioned therein.

24. The method according to claim 14, wherein generating microdroplets comprises preheating the microdroplets.