Device and method for ion beam etching using space-time detection
First Claim
1. An ion beam etching device that enables producing an etched surface (2) on a semiconductor (1) or an insulant comprising:
- a positive ion source (20), means (23) for guiding a beam (42) of the said ions (40) thereby directing the said beam (42) to the etched surface (2), and means (27) for displacing the etched surface (2) relatively to the ion beam (42), a system for space-time detection (28, 49) of ion interactions (40) of the beam (42) with the etched surface (2), means (24) for interrupting the ion beam (42), and a processing unit (29) linked to the displacement means (27), to the detection system (28) and the beam interruption means (24), controlling the successive operations of;
detecting (40) the interruptions of the ions in the beam (42) with the etched surface (2), beam interruption (42), relative displacement of the etched surface (2) in relation to the position of the beam (42) and restoring the beam (42).
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Abstract
The invention concerns a device and a method for ion beam etching for producing an etched surface (2) on a semiconductor (1) or insulant The device comprises a positive ion source (20), means for guiding (23) an ion beam (42), a system for detecting the spatial and temporal interaction of the ions and the etched surface, means for interrupting (24) the beam and means for displacing the etched surface relatively to the beam. A processing unit (29) is connected to the displacing means, to the detecting means and to the beam interrupting means and controls, preferably iteratively, successive, operations detecting interaction of the ion beam and the etched surface, interrupting the beam, relative displacing of the etched surface with respect to the beam position and restoring the beam.
14 Citations
17 Claims
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1. An ion beam etching device that enables producing an etched surface (2) on a semiconductor (1) or an insulant comprising:
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a positive ion source (20), means (23) for guiding a beam (42) of the said ions (40) thereby directing the said beam (42) to the etched surface (2), and means (27) for displacing the etched surface (2) relatively to the ion beam (42), a system for space-time detection (28, 49) of ion interactions (40) of the beam (42) with the etched surface (2), means (24) for interrupting the ion beam (42), and a processing unit (29) linked to the displacement means (27), to the detection system (28) and the beam interruption means (24), controlling the successive operations of;
detecting (40) the interruptions of the ions in the beam (42) with the etched surface (2), beam interruption (42), relative displacement of the etched surface (2) in relation to the position of the beam (42) and restoring the beam (42).- View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16)
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17. An ion beam etching method enabling to produce an etched surface (2) on a semiconductor (1) or insulant. In this method:
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positive ions are produced, a beam (41) of the said ions is sent towards guiding means (23), the ion beam (42) is directed to the etched surface (22) using the guiding means (23), the etched surface (2) is moved relatively to the ion beam (42), characterised in that the following operations are performed iteratively in order to etch the surface (2) considered;
interactions of ions (40) of the beam (42) with the etched surface (2) are detected spatially and temporally, the ion beam (42) is interrupted, the etched surface (2) is moved relatively to the position of the beam (42), and the ion beam (42) is restored.
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Specification