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Method for controlling optical properties of antireflective coatings

  • US 6,403,151 B1
  • Filed: 04/18/2000
  • Issued: 06/11/2002
  • Est. Priority Date: 04/18/2000
  • Status: Expired due to Term
First Claim
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1. A method for processing semiconductors, comprising:

  • forming a first layer above a substrate layer;

    receiving a signal indicating that a semiconductor processing tool has been serviced;

    forming an inorganic antireflective coating layer above the first layer by introducing at least two gases at a first preselected ratio into said semiconductor processing tools; and

    varying the ratio of the gases in response to receiving the signal.

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