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Endpoint detection in the fabrication of electronic devices

  • US 6,406,924 B1
  • Filed: 04/05/1999
  • Issued: 06/18/2002
  • Est. Priority Date: 04/17/1998
  • Status: Expired due to Term
First Claim
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1. A chamber for processing a substrate, the chamber comprising:

  • (a) a radiation source capable of emitting radiation having a wavelength that is substantially absorbed in a pathlength in a thickness of a layer on the substrate; and

    (b) a radiation detector adapted to detect the radiation.

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