Method of determining the doping concentration across a surface of a semiconductor material
First Claim
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1. A system for determining a doping concentration uniformity of a semiconductor wafer, comprising:
- a stage accommodating a wafer to be evaluated;
an atomic force microscope system operatively coupled to the stage;
magnetic field means associated with the stage for subjecting the wafer to a magnetic field and deflecting carriers in the wafer to a surface of the wafer, thereby generating an accumulated charge profile; and
a controller operatively coupled to the stage and the atomic force microscope for dictating the detection of the accumulated charge profile on the wafer and controlling a positional relationship between the stage and the atomic force microscope.
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Abstract
A method (100) of determining a doping concentration of a semiconductor material (101) includes the steps of moving carriers (102) in the material, wherein a number of carriers is a function of the doping concentration of the material (101). The carriers are deflected (130) toward a surface (110) of the material (101) and an accumulated charge profile on the surface of the material, due to the deflected carriers, is detected (140) and used to calculate (180) the doping concentration across a surface (110) of the material (101).
23 Citations
6 Claims
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1. A system for determining a doping concentration uniformity of a semiconductor wafer, comprising:
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a stage accommodating a wafer to be evaluated;
an atomic force microscope system operatively coupled to the stage;
magnetic field means associated with the stage for subjecting the wafer to a magnetic field and deflecting carriers in the wafer to a surface of the wafer, thereby generating an accumulated charge profile; and
a controller operatively coupled to the stage and the atomic force microscope for dictating the detection of the accumulated charge profile on the wafer and controlling a positional relationship between the stage and the atomic force microscope. - View Dependent Claims (2, 3, 4, 5, 6)
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Specification