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Sputtering target and its manufacturing method

  • US 6,409,965 B1
  • Filed: 09/21/2000
  • Issued: 06/25/2002
  • Est. Priority Date: 09/21/1999
  • Status: Expired due to Term
First Claim
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1. A method for manufacturing a sputtering target, the method comprising:

  • presenting an alloy powder which contains at least 65 weight percent of at least one rare earth alloy powder, wherein the at least one rare earth alloy powder comprises at least one rare earth element, at least two elements selected from the group consisting of Fe, Co, Ni, Cr and Si, and at least one recycled alloy powder prepared by using a target used at least once for sputtering;

    melting the alloy powder; and

    atomizing the melted alloy powder, wherein the alloy powder includes no more than 0.1 weight percent metal impurities from a crushing member.

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