Interface texturing for light-emitting device
First Claim
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1. A method of manufacturing an interface texturing for a light-emitting device, comprising the step of:
- providing a substrate;
forming a photoresist layer over the substrate;
performing a first exposure step, which is to project a plurality of interference lines formed by a plurality of overlaid coherent light beams to the photoresist layer;
performing a step of develop to form a textured pattern on the surface of the photoresist layer; and
performing an etching process to transfer the photoresist pattern to the substrate.
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Abstract
An interface texturing for light-emitting device is formed by utilizing holographic lithography. Two coherent light beams are overlaid to cause constructive and destructive interference and thereby periodical alternative bright and dark lines are formed. A wafer coated with photoresist material is exposed under the interference lines. After developing step, a photoresist pattern with textured surface is formed on the wafer. Thereafter, the textured photoresist pattern is transferred to the wafer by etching process and result in a desired interface texturing.
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Citations
14 Claims
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1. A method of manufacturing an interface texturing for a light-emitting device, comprising the step of:
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providing a substrate;
forming a photoresist layer over the substrate;
performing a first exposure step, which is to project a plurality of interference lines formed by a plurality of overlaid coherent light beams to the photoresist layer;
performing a step of develop to form a textured pattern on the surface of the photoresist layer; and
performing an etching process to transfer the photoresist pattern to the substrate. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14)
rotating the photoresist layer and substrate 90 degrees; and
performing a second exposure step, which is to project the plurality of interference lines formed by the plurality of overlaid coherent light beams to the photoresist layer.
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11. The method according to claim 1, wherein after performing the first exposure step, further comprising:
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rotating the photoresist layer and substrate 60 degrees in a same direction;
performing a second exposure step, which is to project the plurality of interference lines formed by the plurality of overlaid coherent light beams to the photoresist layer;
rotating the photoresist layer, and substrate 60 degrees in the same direction continuously; and
performing a third exposure step, which is to project the plurality of interference lines formed by the plurality of overlaid coherent light beams to the photoresist layer.
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12. The method according to claim 11, wherein the same direction is clockwise.
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13. The method according to claim 11, wherein the same direction is anti-clockwise.
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14. The method according to claim 3, wherein the active layer is p-n junction active layer.
Specification