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Interface texturing for light-emitting device

  • US 6,410,348 B1
  • Filed: 08/01/2000
  • Issued: 06/25/2002
  • Est. Priority Date: 07/20/2000
  • Status: Expired due to Term
First Claim
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1. A method of manufacturing an interface texturing for a light-emitting device, comprising the step of:

  • providing a substrate;

    forming a photoresist layer over the substrate;

    performing a first exposure step, which is to project a plurality of interference lines formed by a plurality of overlaid coherent light beams to the photoresist layer;

    performing a step of develop to form a textured pattern on the surface of the photoresist layer; and

    performing an etching process to transfer the photoresist pattern to the substrate.

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