Method and apparatus for modeling thickness profiles and controlling subsequent etch process

• US 6,410,351 B1
• Filed: 07/13/2000
• Issued: 06/25/2002
• Est. Priority Date: 07/13/2000
• Status: Expired due to Term

• Current Assignee: GlobalFoundries, Inc.
• Original Assignee: Advanced Micro Devices, Inc.
• Inventors: Toprac, Anthony J., Bode, Christopher A.
• Primary Examiner(s): Niebling, John F.
• Assistant Examiner(s): Stevenson, Andre C
• Application Number:
  US09/615,481
• Time in Patent Office: 712 Days
• Field of Search: 438/629, 438/220, 438/595, 438/710, 700/121, 156/345
• US Class Current: 438/14
• CPC Class Codes: H01L 22/20 Sequence of activities consisting of a plurality of measurements, corrections, marking or sorting steps

Abstract

A processing line includes a deposition tool, a metrology tool, an etch tool, and a process controller. The deposition tool is adapted to form a process layer on a plurality of wafers. The metrology tool is adapted to measure the thickness of the process layer for a sample of the wafers. The etch tool is adapted to etch the process layer in accordance with an operating recipe. The process controller is adapted to store a thickness profile model of the deposition tool, generate predicted process layer thicknesses for the wafers not measured by the metrology tool based on the process layer thickness measurements of the wafers in the sample and the thickness profile model, and modify the operating recipe of the etch tool based on the predicted process layer thicknesses. A method for controlling wafer uniformity includes storing a thickness profile model of a deposition tool; depositing a process layer on a plurality of wafers in the deposition tool; measuring the thickness of the process layer for a sample of the wafers; generating predicted process layer thicknesses for the wafers not measured based on the process layer thickness measurements and the thickness profile model; and etching the process layer in an etching tool in accordance with an operating recipe, the operating recipe being based on the predicted process layer thicknesses.

Claims

1. A method for controlling wafer uniformity, comprising:

storing a thickness profile model of a deposition tool;

concurrently depositing a process layer on a plurality of wafers in the deposition tool;

measuring the thickness of the process layer for a sample of the wafers;

generating predicted process layer thicknesses for the wafers not measured based on the process layer thickness measurements and the thickness profile model; and

etching the process layer in an etching tool in accordance with an operating recipe, the operating recipe being based on the predicted process layer thicknesses.

2. The method of claim 1, wherein the deposition tool includes a plurality of control zones, and measuring the thickness of the process layer for the sample of wafers includes measuring the thickness of the process layer for at least one wafer from each of the control zones.

3. The method of claim 1, wherein generating predicted process layer thicknesses includes generating the predicted process layer thicknesses based on an operating recipe of the deposition tool.

4. The method of claim 1, wherein generating the predicted process layer thicknesses includes generating the predicted process layer thicknesses based on at least one of a deposition time and a temperature parameter in the operating recipe of the deposition tool.

5. The method of claim 1, wherein the deposition tool includes a plurality of control zones and generating the predicted process layer thicknesses includes generating the predicted process layer thicknesses based on a temperature parameter associated with each of the zones in the operating recipe of the deposition tool.

6. The method of claim 1, further comprising modifying the operating recipe of the etch tool based on the predicted process layer thicknesses.

7. The method of claim 6, wherein modifying the operating recipe includes modifying an etch time parameter in the operating recipe of the etch tool based on the predicted process layer thicknesses.

8. The method of claim 7, wherein modifying the operating recipe of the etch tool based on the predicted process layer thicknesses includes:

associating the predicted process layer thicknesses with wafer identification numbers of the wafers;

determining the wafer identification number of a particular wafer being etched;

accessing the predicted process layer thickness of the particular wafer; and

modifying the operating recipe of the etch tool for the particular wafer.

9. The method of claim 8, wherein associating the predicted process layer thicknesses with wafer identification numbers of the wafers includes associating a particular predicted process layer thickness with a subset of the wafers.

10. A processing line, comprising:

a deposition tool adapted to concurrently form a process layer on a plurality of wafers;

a metrology tool adapted to measure the thickness of the process layer for a sample of the wafers;

an etch tool adapted to etch the process layer in accordance with an operating recipe; and

a process controller adapted to store a thickness profile model of the deposition tool, generate predicted process layer thicknesses for the wafers not measured by the metrology tool based on the process layer thickness measurements of the wafers in the sample and the thickness profile model, and modify the operating recipe of the etch tool based on the predicted process layer thicknesses.

11. The processing line of claim 10, wherein the deposition tool includes a plurality of control zones, and the sample of wafers measured by the metrology tool includes at least one wafer from each of the control zones.

12. The processing line of claim 10, wherein the process controller is adapted to generate the predicted process layer thicknesses based on an operating recipe of the deposition tool.

13. The processing line of claim 10, wherein the operating recipe of the deposition tool includes at least one of a deposition time and a temperature parameter in the operating recipe.

14. The processing line of claim 10, wherein the deposition tool includes a plurality of control zones, and the process controller is adapted to generate the predicted process layer thicknesses based on a temperature parameter associated with each of the zones in the operating recipe.

15. The processing line of claim 10, wherein the process controller is adapted to modify an etch time parameter in the operating recipe of the etch tool based on the predicted process layer thicknesses.

16. The processing line of claim 10, wherein the process controller is adapted to associate the predicted process layer thicknesses with wafer identification numbers of the wafers, determine the wafer identification number of a particular wafer being etched, access the predicted process layer thickness of the particular wafer, and modifying the operating recipe of the etch tool for the particular wafer.

17. The processing line of claim 10, wherein the process controller is adapted to associate a particular predicted process layer thickness with a subset of the wafers.

18. A processing line, comprising:

a deposition tool adapted to concurrently form a process layer on a plurality of wafers;

means for storing a thickness profile model of the deposition tool;

means for measuring the thickness of the process layer for a sample of the wafers;

means for generating predicted process layer thicknesses for the wafers not measured based on the process layer thickness measurements and the thickness profile model; and

means for etching the process layer in an etching tool in accordance with an operating recipe, the operating recipe being based on the predicted process layer thicknesses.