Method of processing a workpiece using an externally excited torroidal plasma source

• US 6,410,449 B1
• Filed: 08/11/2000
• Issued: 06/25/2002
• Est. Priority Date: 08/11/2000
• Status: Expired due to Fees

• Current Assignee: Applied Materials Incorporated
• Original Assignee: Applied Materials Incorporated
• Inventors: Tanaka, Tsutomu, Ye, Yan, Ramaswamy, Kartik, Hanawa, Hiroji, Nguyen, Andrew, Collins, Kenneth S
• Primary Examiner(s): Hiteshew, Felisa
• Assistant Examiner(s): PEREZ RAMOS, VANESSA
• Application Number:
  US09/636,436
• Time in Patent Office: 683 Days
• Field of Search: 438/710, 438/706, 438/711
• US Class Current: 438/706
• CPC Class Codes: H01J 37/32082 Radio frequency generated discharge H01J37/32357, H01J37/32366, H01J37/32394 and H01J37/32403 take precedence
• CPC Class Codes: H01J 37/321 the radio frequency energy being inductively coupled to the plasma

Abstract

A method of processing a workpiece in a plasma reactor includes establishing a torroidal path for a plasma current to flow that passes near and transverse to the surface of said workpiece, maintaining a plasma current in the torroidal path by applying RF power to a portion of the torroidal path away from the surface of the workpiece, and increasing the ion density of the plasma current in the vicinity of the workpiece by constricting the area of a portion of the torroidal path overlying the workpiece.

Claims

1. A method of processing a workpiece in a plasma reactor, comprising:

establishing a torroidal path for a plasma current to flow that passes near and transverse to the surface of said workpiece;

maintaining a plasma current in said torroidal path by applying RF power to a portion of said torroidal path away from said surface of said workpiece;

increasing the ion density of the plasma current in the vicinity of said workpiece by constricting the area of a portion of said torroidal path overlying said workpiece.

2. The method of claim 1 wherein the step of constricting comprises increasing the level of an RF bias signal applied to said workpiece.

3. The method of claim 1 wherein the step of constricting comprises introducing a mechanical constriction in said torroidal path over said workpiece.

4. The method of claim 3 wherein said mechanical constriction is a gas distribution apparatus facing said workpiece.

5. The method of claim 4 further comprising:

introducing a reactive gas into said reactor exclusively through said gas distribution apparatus;

introducing a diluent gas into a portion of said torroidal path distant from said workpiece.

6. A method of processing a workpiece in a plasma reactor, comprising:

establishing a torroidal path for a plasma current to flow that passes near and transverse to the surface of said workpiece;

maintaining a plasma current in said torroidal path by applying RF power to a portion of said torroidal path away from said surface of said workpiece;

introducing a reactive process gas into said plasma current;

reducing the residency time of said reactive gas in said plasma.

7. The method of claim 6 wherein the step of reducing the residency time comprises:

increasing the power of a bias RF signal applied to said workpiece so as to increase the thickness of a plasma sheath around said workpiece.

8. The method of claim 6 wherein the step of reducing the residency time comprises:

introducing a diluent gas into a portion of said plasma current distant from said workpiece while introducing said reactive gas into a process region overlying said workpiece, whereby the diluent gas in said plasma current sweeps away reactive species from the process region.