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Production method of thin film resistance element formed on printed circuit board, and thin film resistance element employing the method

  • US 6,411,194 B2
  • Filed: 02/27/2001
  • Issued: 06/25/2002
  • Est. Priority Date: 03/30/2000
  • Status: Expired due to Term
First Claim
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1. A production method of a thin film resistance element formed on a printed circuit board having an insulation layer, comprising the steps of:

  • roughening or activating a surface of the insulation layer by a dry process used in producing a semiconductor;

    forming a thin film resistance layer having a predetermined thickness on the roughened or activated surface of the insulation layer by a dry process used in producing a semiconductor and in a vacuum such that the insulation layer is not oxidized during the formation of the thin film resistance layer;

    forming an electrically conductive layer on the thin film resistance layer;

    forming a first copper layer on the thin film resistance layer by a sputtering method;

    forming a second copper layer on the first copper layer by an electric plating method; and

    etching the electrically conductive layer selectively so as to make, at least, a pair of electrically conductive pads, resulting in the thin film resistance element having a predetermined value of resistivity between the pair of electrically conductive pads.

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