Production method of thin film resistance element formed on printed circuit board, and thin film resistance element employing the method
First Claim
1. A production method of a thin film resistance element formed on a printed circuit board having an insulation layer, comprising the steps of:
- roughening or activating a surface of the insulation layer by a dry process used in producing a semiconductor;
forming a thin film resistance layer having a predetermined thickness on the roughened or activated surface of the insulation layer by a dry process used in producing a semiconductor and in a vacuum such that the insulation layer is not oxidized during the formation of the thin film resistance layer;
forming an electrically conductive layer on the thin film resistance layer;
forming a first copper layer on the thin film resistance layer by a sputtering method;
forming a second copper layer on the first copper layer by an electric plating method; and
etching the electrically conductive layer selectively so as to make, at least, a pair of electrically conductive pads, resulting in the thin film resistance element having a predetermined value of resistivity between the pair of electrically conductive pads.
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Accused Products
Abstract
The invention provides a production method capable of forming a thin film resistance element having a thickness and a shape controlled in a high accuracy in a printed circuit board. The production method of a thin film resistance element formed on a printed circuit board, has the steps of forming a thin film resistance layer having a predetermined thickness on the printed circuit board through an insulation layer by a dry process used in producing a semiconductor, forming an electrically conductive layer on the thin resistance layer, and etching the electrically conductive layer selectively so as to make, at least, a pair of electrically conductive pads, resulting in the thin film resistance element having a predetermined value of resistivity between the pair of electrically conductive pads. Thereby, it is possible to form the thin film resistance element having a thickness and a shape controlled in a high accuracy on the printed circuit board.
9 Citations
6 Claims
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1. A production method of a thin film resistance element formed on a printed circuit board having an insulation layer, comprising the steps of:
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roughening or activating a surface of the insulation layer by a dry process used in producing a semiconductor;
forming a thin film resistance layer having a predetermined thickness on the roughened or activated surface of the insulation layer by a dry process used in producing a semiconductor and in a vacuum such that the insulation layer is not oxidized during the formation of the thin film resistance layer;
forming an electrically conductive layer on the thin film resistance layer;
forming a first copper layer on the thin film resistance layer by a sputtering method;
forming a second copper layer on the first copper layer by an electric plating method; and
etching the electrically conductive layer selectively so as to make, at least, a pair of electrically conductive pads, resulting in the thin film resistance element having a predetermined value of resistivity between the pair of electrically conductive pads. - View Dependent Claims (2, 3)
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4. A printed circuit board having a thin film resistance element produced by the production method comprising the steps of:
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roughening or activating a surface of the insulation layer by a dry process used in producing a semiconductor;
forming a thin film resistance layer having a predetermined thickness of the insulation layer by a dry process used in producing a semiconductor and in a vacuum such that the insulation layer is not oxidized during the formation of the insulating layer;
forming an electrically conductive layer on the thin film resistance layer;
forming a first copper layer on the thin film resistance layer by a sputtering method;
forming a second copper layer on the first copper layer by an electrical plating method; and
etching the electrically conductive layer selectively so as to make at least a pair of electrically conductive pads, resulting in the thin film resistance element having a predetermined value of resistivity between the pair of electrically conductive pads. - View Dependent Claims (5, 6)
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Specification