Stage apparatus, and exposure apparatus and device manufacturing method using the same

• US 6,414,742 B1
• Filed: 12/11/1998
• Issued: 07/02/2002
• Est. Priority Date: 12/26/1997
• Status: Expired due to Term

• Current Assignee: Canon Ayutthaya Limited (Canon Inc.)
• Original Assignee: Canon Kabushiki Kaisha (Canon Inc.)
• Inventors: Korenaga, Nobushige, Yabu, Shuichi
• Primary Examiner(s): Adams, Russell
• Assistant Examiner(s): Brown, Khaled
• Application Number:
  US09/209,495
• Publication Number:
  US 20020021423A1
• Time in Patent Office: 1,299 Days
• Field of Search: 355/53, 318/135, 310/12
• US Class Current: 355/53
• CPC Class Codes: G03B 27/42 for automatic sequential copying of the same original G03B27/34, G03B27/53 take precedence
• CPC Class Codes: G03F 7/70691 Handling of masks or workpieces
• CPC Class Codes: G03F 7/709 Vibration, e.g. vibration detection, compensation, suppression or isolation

Abstract

A stage apparatus includes a movable stage, a base supporting the stage on a reference plane, a driving mechanism for driving the stage, and a rotor acting on the stage and producing a moment so as to reduce a reaction force produced along with the movement of the stage. The rotor also reduces the reaction force produced upon movement of the stage by the movement of the base and the rotation of the rotor.

Claims

1. A stage apparatus comprising:

a movable stage;

a base, having a reference plane, supporting said stage;

a driving mechanism driving said stage to move with respect to the base; and

a rotating mechanism attached to said base, said rotating mechanism having a rotating member provided rotatably with respect to said base, said rotating member producing a moment in the base so as to reduce a moment in the base produced by a reaction force produced along with movement of said stage.

2. A stage apparatus according to claim 1, wherein said rotating mechanism is provided on a member receiving the reaction force.

3. A stage apparatus according to claim 2, wherein the member receiving the reaction force is said base supporting said stage.

4. A stage apparatus according to claim 3, wherein said base moves to reduce the reaction force.

5. A stage apparatus according to claim 3, wherein said rotating mechanism produces the moment around an axis at right angles to the reference plane.

6. A stage apparatus according to claim 3, wherein said rotor produces the moment around an axis parallel to the reference plane.

7. A stage apparatus according to claim 4, further comprising a constraining mechanism which constrains motion of said base in the rotating direction within the reference plane.

8. A stage apparatus according to claim 3, wherein said stage is an XY-stage having a guide provided on said base.

9. A stage apparatus according to claim 3, wherein said driving mechanism is a guideless motor fixed to said stage.

10. A stage apparatus according to claim 9, wherein said guideless motor is a pulse motor.

11. A stage apparatus according to claim 9, wherein said guideless motor is an induction motor.

12. A stage apparatus according to claim 2, wherein the member receiving the reaction force is a reaction force receiving mechanism arranged independently of said stage.

13. A stage apparatus according to claim 12, wherein the reaction force receiving mechanism includes a member integrally fixed to a floor.

14. An exposure apparatus comprising:

a stage apparatus comprising (i) a movable stage, (ii) a base, having a reference plane, supporting said stage, (iii) a driving mechanism driving said stage to move with respect to the base and (iv) a rotating mechanism attached to said base, said rotating mechanism having a rotating member provided rotatably with respect to said base, said rotating member producing a moment in the base so as to reduce a moment in the base produced by a reaction force produced along with movement of said state; and

a light source producing exposure light for exposing a wafer via a reticle.

15. A device manufacturing method comprising:

a step of providing an exposure apparatus including a stage apparatus comprising (i) a movable stage, (ii) a base, having a reference plane, supporting the stage, (iii) a driving mechanism driving the stage to move with respect to the base and (iv) a rotating mechanism attached to said base, said rotating mechanism having a rotating member provided rotatably with respect to said base, said rotating member producing a moment in the base so as to reduce a moment in the base produced by a reaction force produced along with movement of the said stage; and

a step of transferring a pattern formed on a reticle onto a wafer, by the use of the exposure apparatus.

16. A method according to claim 15, further comprising:

a step of coating a photosensitive material onto the wafer; and

a step of developing the photosensitized wafer.

17. A stage apparatus comprising:

a movable stage;

a base, having a reference plane, supporting said stage;

a driving mechanism driving said stage to move with respect to the base; and

a moment producer attached to the base for producing a moment in the base,

wherein said moment producer produces the moment around an axis parallel to the reference plane.

18. A stage apparatus according to claim 17, wherein said moment producer has a movable member which is rotatable with respect to said base.

19. A stage apparatus according to claim 17, wherein said moment producer produces the moment so as to reduce a moment produced in said base by a reaction force produced along with movement of said stage.

20. A stage apparatus according to claim 17, wherein said base moves to reduce a reaction force produced along with movement of said stage.

21. A stage apparatus according to claim 17, wherein said stage is an XY-stage.

22. A stage apparatus according to claim 17, wherein said driving mechanism is a guideless motor.

23. A stage apparatus comprising:

a movable stage;

a base, having a reference plane, supporting said stage;

a guideless motor driving said stage to move with respect to said base; and

a moment producer attached to the base for producing a moment in said base.

24. A stage apparatus according to claim 23, wherein said moment producer produces the moment around an axis parallel to the reference plane.

25. A stage apparatus according to claim 23, wherein said moment producer has a movable member which is rotatable with respect to said base.

26. A stage apparatus according to claim 23, wherein said moment producer produces the moment so as to reduce a moment produced in said base by a reaction force produced along with movement of said stage.

27. A stage apparatus according to claim 23, wherein said base moves to reduce a reaction force produced along with movement of said stage.

28. A stage apparatus according to claim 23, wherein said stage is an XY-stage.

29. An exposure apparatus comprising:

a stage apparatus comprising (i) a movable stage, (ii) a base, having a reference plane, supporting said stage, (iii) a driving mechanism driving said stage to move with respect to the base and (iv) a moment producer attached to the base for producing a moment in the base, wherein said moment producer produces the moment around an axis parallel to the reference plane; and

a light source producing exposure light for exposing a wafer via a reticle.

30. A device manufacturing method comprising:

a step of providing an exposure apparatus including a stage apparatus comprising (i) a movable stage, (ii) a base, having a reference plane, supporting the stage, (iii) a driving mechanism driving the stage to move with respect to the base, and (iv) a moment producer attached to the base for producing a moment in the base, wherein the moment producer produces the moment around an axis parallel to the reference plane; and

a step of transferring a pattern formed on a reticle onto a wafer, by use of the exposure apparatus.

31. An exposure apparatus comprising:

a stage apparatus comprising (i) a movable stage, (ii) a base, having a reference plane, supporting said stage, (iii) a guideless motor driving said stage to move with respect to the base and (iv) a moment producer attached to the base for producing a moment in the base; and

a light source producing exposure light for exposing a wafer via a reticle.

32. A device manufacturing method comprising:

a step of providing an exposure apparatus including a stage apparatus comprising (i) a movable stage, (ii) a base, having a reference plane, supporting the stage, (iii) a guidless motor driving the stage to move with respect to the base and (iv) a moment producer attached to the base for producing a moment in the base; and

a step of transferring a pattern formed on a reticle onto a wafer, by use of the exposure apparatus.