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Exposure apparatus, exposure method using the same and method of manufacture of circuit device

  • US 6,414,743 B1
  • Filed: 10/18/1999
  • Issued: 07/02/2002
  • Est. Priority Date: 04/18/1997
  • Status: Expired due to Fees
First Claim
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1. An exposure method for irradiating a mask with an illumination light through an illumination optical system and exposing photosensitive substrate to the illumination light through a projection optical system;

  • comprising the steps of;

    supplying gas having less absorption of the illumination light to a light path of the illumination light, at least a portion of the illumination optical system and the projection optical system; and

    changing an exposing condition for the photosensitive substrate in accordance with a variation in transmittance or in reflectance of at least one of the illumination optical system and the projection optical system, resulting from irradiation of the illumination light and attenuation of the illumination light in the light path.

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