Exposure apparatus, exposure method using the same and method of manufacture of circuit device
First Claim
1. An exposure method for irradiating a mask with an illumination light through an illumination optical system and exposing photosensitive substrate to the illumination light through a projection optical system;
- comprising the steps of;
supplying gas having less absorption of the illumination light to a light path of the illumination light, at least a portion of the illumination optical system and the projection optical system; and
changing an exposing condition for the photosensitive substrate in accordance with a variation in transmittance or in reflectance of at least one of the illumination optical system and the projection optical system, resulting from irradiation of the illumination light and attenuation of the illumination light in the light path.
1 Assignment
0 Petitions
Accused Products
Abstract
An exposure method for irradiating a mask with an illumination light through an illumination optical system and exposing photosensitive substrate to the illumination light through a projection optical system including the steps of supplying gas having less absorption of the illumination light to a light path of the illumination light, at least a portion of the illumination optical system and the projection optical system; and changing an exposing condition for the photosensitive substrate in accordance with a variation in transmittance or in reflectance of at least one of the illumination optical system and the projection optical system, resulting from irradiation of the illumination light and attenuation of the illumination light in the light path.
-
Citations
21 Claims
-
1. An exposure method for irradiating a mask with an illumination light through an illumination optical system and exposing photosensitive substrate to the illumination light through a projection optical system;
- comprising the steps of;
supplying gas having less absorption of the illumination light to a light path of the illumination light, at least a portion of the illumination optical system and the projection optical system; and
changing an exposing condition for the photosensitive substrate in accordance with a variation in transmittance or in reflectance of at least one of the illumination optical system and the projection optical system, resulting from irradiation of the illumination light and attenuation of the illumination light in the light path. - View Dependent Claims (2, 3, 4, 5)
- comprising the steps of;
-
6. An exposure method comprising:
-
supplying gas having less absorption of an exposure light to a housing which forms a light path of an exposure light between a light source and a photosensitive substrate and which houses optical elements disposed in the light path;
filling the light path with the gas; and
changing an exposing condition for the substrate in accordance with an energy of the exposure light passed through the light path, which varies according to substances present in the light path which absorb the exposure light, and to a variation in the characteristics of the optical elements or a membrane material deposited on a surface of the optical element. - View Dependent Claims (7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20, 21)
-
Specification