Organic electroluminescence device and manufacturing method thereof
First Claim
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1. An organic electroluminescence device comprising:
- a plurality of first electrodes of transparent conductive film patterns formed on a transparent substrate;
an organic thin film formed on the first electrodes; and
a second electrode formed on the organic thin film, wherein a recess, which is an interval region between the first electrodes, is embedded with a photo resist, the thickness of the photo resist is as same as that of the first electrode.
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Abstract
An organic electroluminescent device comprising a plurality of first electrodes of transparent conductive film patterns formed on a transparent substrate; an organic thin film formed on the first electrodes; and a second electrode formed on the organic thin film, wherein a recess, which is an interval region between the first electrodes, is embedded with a photo resist. Therefore, even if the thickness of the first electrodes is increased, the occurrence of defective coverage at the edge portion of first electrodes can be prevented.
14 Citations
5 Claims
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1. An organic electroluminescence device comprising:
- a plurality of first electrodes of transparent conductive film patterns formed on a transparent substrate;
an organic thin film formed on the first electrodes; and
a second electrode formed on the organic thin film, wherein a recess, which is an interval region between the first electrodes, is embedded with a photo resist, the thickness of the photo resist is as same as that of the first electrode.
- a plurality of first electrodes of transparent conductive film patterns formed on a transparent substrate;
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2. An organic electroluminescence device comprising:
- a plurality of first electrodes of transparent conductive film patterns formed on a transparent substrate;
an organic thin film formed on the first electrodes; and
a second electrode formed on the organic thin film, wherein a recess, which is an interval region between the first electrodes, is embedded with a photo resist, wherein the photo resist is made of photocurable resin cured by exposing the photocurable resin to light.
- a plurality of first electrodes of transparent conductive film patterns formed on a transparent substrate;
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3. An organic electroluminescence device comprising:
- a plurality of first electrodes of transparent conductive film patterns formed on a transparent substrate;
an organic thin film formed on the first electrodes; and
a second electrode formed on the organic thin film, wherein a recess, which is an interval region between the first electrodes, is embedded with a photo resist, wherein the first electrodes are made of ITO film patterns, and the second electrode is made of a metal film.
- a plurality of first electrodes of transparent conductive film patterns formed on a transparent substrate;
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4. An organic electroluminescence device comprising:
- a plurality of first electrodes of transparent conductive film patters formed on a transparent substrate;
an organic thin film formed on the first electrodes; and
a second electrode formed on the organic thin film, wherein a recess, which is an interval region between the first electrodes, is embedded with a photo resist, wherein the first electrodes are made of the first line patterns arranged with predetermined interval regions;
the photo resist is embedded in the interval regions so that the thickness is as same as that of the first electrodes;
the organic film is formed so as to cover the first electrodes and the photo resist and the second electrode is made of plurality of second line patterns arranged in perpendicular to the first line patterns.
- a plurality of first electrodes of transparent conductive film patters formed on a transparent substrate;
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5. An organic electroluminescence device comprising:
- a plurality of first electrodes of transparent conductive film patterns formed on a transparent substrate;
an organic thin film formed on the first electrodes; and
a second electrode formed on the organic thin film, wherein a recess, which is an interval region between the first electrodes, is embedded with a photo resist, wherein the recess is embedded with the photo resist so that a uniformly flat surface is formed across the first electrodes and photo resist.
- a plurality of first electrodes of transparent conductive film patterns formed on a transparent substrate;
Specification
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Current AssigneeJOLED Inc.
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Original AssigneeMatsushita Electric Industrial Company Limited (Panasonic Holdings Corporation)
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InventorsGyoutoku, Akira, Iwanaga, Hideaki
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Primary Examiner(s)Kelly, Cynthia H.
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Assistant Examiner(s)GARRETT, DAWN L
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Application NumberUS09/170,556Time in Patent Office1,365 DaysField of Search428/690, 428/917, 313/503, 313/505, 257/91, 257/99US Class Current428/690CPC Class CodesH05B 33/10 Apparatus or processes spec...H10K 2102/351 ThicknessH10K 50/81 AnodesH10K 59/17 Passive-matrix OLED displaysY10S 428/917 Electroluminescent
