Wide tuning range variable MEMs capacitor

• US 6,418,006 B1
• Filed: 12/20/2000
• Issued: 07/09/2002
• Est. Priority Date: 12/20/2000
• Status: Expired due to Term

• Current Assignee: Board of Trustees of The University of Illinois
• Original Assignee: Board of Trustees of The University of Illinois
• Inventors: Zou, Jun, Liu, Chang
• Primary Examiner(s): Nguyen, Chau N.
• Assistant Examiner(s): Ha, Nguyen T
• Application Number:
  US09/742,518
• Publication Number:
  US 20020075626A1
• Time in Patent Office: 566 Days
• Field of Search: 361/277, 361/278, 361/280, 361/281, 361/290, 361/232.2, 361/288, 361/287, 361/291, 361/282.3, 361/283.4, 361/283.1, 361/233, 334/10, 334/14
• US Class Current: 361/277
• CPC Class Codes: H01G 5/16 using variation of distance between electrodes

Abstract

A MEM capacitor having a capacitance plate nearer a movable plate than a separate bias plate. Voltage potential between the bias plate and movable plate determines the value of capacitance between the movable plate and the capacitance plate. In a preferred MEM capacitor, the movable plate is suspended over two fixed plates, a bias plate and a capacitance plate. The movable plate is disposed opposite both the bias plate and the capacitance plate. A distance between opposing surfaces of the capacitance plate and the movable plate is less than a distance between the bias plate and the capacitance plate. Preferably, the relative difference in distances between the plates is accomplished by a mechanically suspended movable plate that is shaped to have portions in at least two separate planes.

Claims

1. A variable micro electromechanical capacitor, comprising:

a bias plate;

a capacitance plate; and

a movable plate held by a supporting suspension, the movable plate being disposed opposite both said bias plate and said capacitance plate and being movable relative to said capacitance plate;

wherein

a distance between opposing surfaces of said capacitance plate and said movable plate is less than a distance between said bias plate and said capacitance plate.

2. The capacitor according to claim 1, wherein the distance between opposing surfaces of said capacitance plate and said movable plate is less than or equal to one third of the distance between said bias plate and said capacitance plate.

3. The capacitor according to claim 2, wherein said movable plate comprises a plate having an offset area, the offset area being aligned with said capacitance plate to set the distance between a surface of said capacitance plate defined by said offset area and said movable plate less than or equal to one third of the distance between said bias plate and a surface of said capacitance plate opposite said bias plate.

4. The capacitor according to claim 3, wherein said movable plate is supported by a cantilever suspension suspended by a plurality of cantilever beams.

5. The capacitor according to claim 4, wherein said offset area is formed in a central portion of said movable plate, said capacitance plate is opposite said central portion, and said bias plate substantially surrounds said capacitance plate to be disposed opposite a substantial remaining portion of said movable plate.

6. The capacitor according to claim 4, wherein said cantilever beams are connected to contact pads.

8. The capacitor according to claim 2, wherein the distance between opposing surfaces of said capacitance plate and said movable plate and the distance between said bias plate and said capacitance plate are on the order of ones to tens of micrometers.

9. The capacitor according to claim 2, wherein said bias plate, said capacitance plate and said movable plate comprise thin film metal plates.

10. The capacitor according to claim 2, wherein said bias plate and said capacitance plate are formed on the surface of a common substrate and said movable plate is movable suspended opposite said bias plate from a cantilever suspension to said common substrate.

11. The capacitor according to claim 10, wherein said cantilever suspension comprises a set of cantilever beams connected to contact pads.

7. The capacitor according 6, comprising four cantilever beams connected to four contact pads and said movable plate.

12. The capacitor according 11, wherein said set of cantilever beams comprises four cantilever beams connected to four contact pads and four separate sides of said movable plate.

13. A micro electromechanical capacitor, comprising:

a substrate;

a thin film capacitance plate and associated electrical contact both formed on a surface of said substrate;

a thin film bias plate and associated electrical contact both formed on said surface of said substrate;

a set of contact pads on said substrate; and

a thin film movable plate suspended over said thin film capacitance plate and said thin film bias plate from a set of cantilever arms terminating at said contact pads to form an air gap between said thin film capacitance plate and said thin film bias plate, wherein

said thin film movable plate is shaped to be closer to said capacitance plate than said bias plate.

14. The capacitor according to claim 13, wherein a distance between opposing surfaces of said capacitance plate and said movable plate is less than or equal to one third of a distance between said bias plate and said capacitance plate.