Semiconductor device having an impurity region overlapping a gate electrode

• US 6,420,758 B1
• Filed: 11/16/1999
• Issued: 07/16/2002
• Est. Priority Date: 11/17/1998
• Status: Expired due to Term

• Current Assignee: Semiconductor Energy Laboratory Co., Ltd.
• Original Assignee: Semiconductor Energy Laboratory Co., Ltd.
• Inventors: Nakajima, Setsuo
• Primary Examiner(s): Ngô, Ngân V.
• Application Number:
  US09/441,258
• Time in Patent Office: 973 Days
• Field of Search: 257/59, 257/72, 257/350, 257/351
• US Class Current: 257/350
• CPC Class Codes: H01L 27/124 with a particular composition, shape or layout of the wiring layers specially adapted to the circuit arrangement, e.g. scanning lines in LCD pixel circuits wiring structures per se H01L23/52
• CPC Class Codes: H01L 27/1255 integrated with passive devices, e.g. auxiliary capacitors
• CPC Class Codes: H01L 29/4908 for thin film semiconductor, e.g. gate of TFT
• CPC Class Codes: H01L 29/66757 Lateral single gate single channel transistors with non-inverted structure, i.e. the channel layer is formed before the gate
• CPC Class Codes: H01L 29/78621 with LDD structure or an extension or an offset region or characterised by the doping profile
• CPC Class Codes: H01L 29/78627 with a significant overlap between the lightly doped drain and the gate electrode, e.g. GOLDD

Abstract

The present invention is directed to a TFT of new structure in which the gate electrode overlaps with the LDD region and a TFT of such structure in which the gate electrode does not overlap with the LDD region. The TFT is made from crystalline semiconductor film and is highly reliable. The TFT of crystalline semiconductor film has the gate electrode formed from a first gate electrode 113 and a second gate electrode in close contact with said first gate electrode and gate insulating film. The LDD is formed by ion doping using said first gate electrode as a mask, and the source-drain region is formed using said second gate electrode as a mask. After that the second gate electrode in the desired region is selectively removed. In this way it is possible to form LDD region which overlaps with the second gate electrode.

Claims

1. A semiconductor device having a first semiconductor element and a second semiconductor element, said first semiconductor element comprising:

a first semiconductor film formed over a substrate on an insulating surface;

a first gate electrode adjacent to said first semiconductor film with a gate insulating film interposed therebetween;

a second gate electrode covering said first gate electrode and being in contact with said gate electrode;

a channel region formed in said first semiconductor film and overlapping with the region in contact with said gate insulating film of said first gate electrode, with said gate insulating film interposed therebetween;

at least one impurity region formed in said first semicondutor and overlapping with the region in contact with said gate insulating film of said second gate electrode, with said gate insulating interposed therebetween; and

a second semiconductor element comprising;

a second semiconductor film formed over the substrate having the insulating surface;

a third gate electrode adjacent to said second semiconductor film with said gate insulating film interposed therebetween;

at least one impurity in said second semiconductor film not overlapping with said third gate electrode.

4. A semiconductor device according to claim 1, wherein said second semiconductor element does not have a gate electrode covering said third gate electrode.

5. A semiconductor device according to claim 1, wherein said impurity region is in contact with said channel region.

6. A semiconductor device according to claim 1, wherein said impurity region contains an impurity element of Group 15 in a concentration of 1×

10¹⁶ to 1×

10¹⁹ atms/cm³.

17. A semiconductor device according to claim 1, wherein said first gate electrode or said third gate electrode is a single layer or multiple layer of a metal or an alloy thereof selected from the group consisting of tantalum (Ta), tantalum nitride (TaN), titanium (Ti), chromium (Cr), tungsten (W), molybdenum (Mo), silicon (Si), aluminum (Al), and copper (Cu).

18. A semiconductor device according to claim 1, wherein the material of said second gate electrode is different from that of said first gate electrode.

25. A semiconductor device according to claim 1, wherein said semiconductor device is a display device using an organic electroluminescence material.

26. A semiconductor device according to claim 1, wherein said semiconductor device is incorporated into an electric equipment selected from the group consisting of a personal computer, a video camera, a portable information terminal, a digital camera, a digital versatile disk player, a goggle type display, and a projector.

2. A semiconductor device having a high voltage circuit consisting of a first semiconductor element and a high speed drive circuit consisting of a second semiconductor element formed over a same substrate having an insulating surface, said first semiconductor element comprising:

a first semiconductor film formed over a substrate having an insulating surface;

a first gate electrode adjacent to said first semiconductor film with said gate insulating film interposed therebetween;

a second gate electrode covering said first gate insulating film and being in contact with said gate insulating film;

a channel region in said semiconductor film and overlapping with the region in contact with said gate insulating film of first gate electrode, with said gate insulating film interposed therebetween;

at least one impurity region overlapping with the region in contact with said gate insulating film of said second gate electrode, with said gate electrode interposed therebetween; and

said second semiconductor element comprising;

a second semiconductor film formed over the substrate having the insulating surface;

a third gate electrode adjacent to said second semiconductor film with said gate insulating film interposed therebetween;

at least one impurity region in said second semiconductor film not overlapping with said third gate electrode.

7. A semiconductor device according to claim 2, wherein said second semiconductor element does not have a gate electrode covering said third gate electrode.

8. A semiconductor device according to claim 2, wherein said impurity region is in contact with said channel region.

9. A semiconductor device according to claim 2, wherein said impurity region contains an impurity element of Group 15 in a concentration of 1×

10¹⁶ to 1×

10¹⁹ atms/cm³.

19. A semiconductor device according to claim 2, wherein said first gate electrode or said third gate electrode is a single layer or multiple layer of a metal or an alloy thereof selected from the group consisting of tantalum (Ta), tantalum nitride (TaN), titanium (Ti), chromium (Cr), tungsten (W), molybdenum (Mo), silicon (Si), aluminum (Al), and copper (Cu).

20. A semiconductor device according to claim 2, wherein the material of said second gate electrode is different from that of said first gate electrode.

27. A semiconductor device according to claim 2, wherein said semiconductor device is a display device using an organic electroluminescence material.

28. A semiconductor device according to claim 2, wherein said semiconductor device is incorporated into an electric equipment selected from the group consisting of a personal computer, a video camera, a portable information terminal, a digital camera, a digital versatile disk player, a goggle type display, and a projector.

3. A semiconductor device having pixels each consisting of an n-channel type thin film transistor and CMOS circuits each consisting of an n-channel type thin film transistor and a p-channel type thin film transistor,

said n-channel type thin film transistor of said pixels comprising:

a first semiconductor film formed over a substrate having an insulating surface;

a first gate electrode formed adjacent to said first semiconductor film with said gate insulating film interposed therebetween;

a second gate electrode covering said first gate electrode and being in contact with said gate insulating film

a channel region formed in said first semiconductor film and overlapping with the region in contact with said gate insulating film of said first gate electrode, with said gate insulating film interposed therebetween;

at least one impurity region in said first semiconductor film and overlapping with the region in contact with said gate insulating film of said second gate electrode, with said gate insulating interposed therebetween; and

said n-channel type thin film transistor of said CMOS circuit comprising;

a second semiconductor film formed over the substrate having on the insulating surface;

a third gate electrode formed adjacent to said second semiconductor film with said gate insulating film interposed therebetween;

at least one impurity region in said second semiconductor film not overlapping with said third gate electrode.

10. A semiconductor device according to claim 3, wherein said second semiconductor element does not have a gate electrode covering said third gate electrode.

11. A semiconductor device according to claim 3, wherein said impurity region is in contact with said channel region.

12. A semiconductor device according to claim 3, wherein said impurity region contains an impurity element of Group 15 in a concentration of 1×

10¹⁶ to 1×

10¹⁹ atms/cm³.

21. A semiconductor device according to claim 3, wherein said first gate electrode or said third gate electrode is a single layer or multiple layer of a metal or an alloy thereof selected from the group consisting of tantalum (Ta), tantalum nitride (TaN), titanium (Ti), chromium (Cr), tungsten (W), molybdenum (Mo), silicon (Si), aluminum (Al), and copper (Cu).

22. A semiconductor device according to claim 3, wherein the material of said second gate electrode is different from that of said first gate electrode.

29. A semiconductor device according to claim 3, wherein said semiconductor device is a display device using an organic electroluminescence material.

30. A semiconductor device according to claim 3, wherein said semiconductor device is incorporated into an electric equipment selected from the group consisting of a personal computer, a video camera, a portable information terminal, a digital camera, a digital versatile disk player, a goggle type display, and a projector.

13. A semiconductor device having CMOS circuits each consisting of an n-channel type thin film transistor and a p-channel type thin film transistor,

said n-channel type thin film transistor comprising:

a semiconductor film formed over a substrate having an insulating surface;

a first gate electrode formed adjacent to said semiconductor film with said gate insulating film interposed therebetween;

a second gate electrode covering said first gate electrode and being in contact with said is gate insulating film;

a channel region in said semiconductor film overlapping with the region in contact with said gate insulating film of said first gate electrode, with said gate insulating film interposed therebetween;

at least one impurity region in said semiconductor film overlapping with the region in contact with said gate insulating film of said second gate electrode, with said gate insulating film interposed therebetween; and

said p-channel type thin film transistor comprising;

a third gate electrode formed adjacent to said semiconductor film with said gate insulating film interposed therebetween;

at least one impurity region in said second semiconductor film not overlapping with said third gate electrode.

14. A semiconductor device according to claim 13, wherein said second semiconductor element does not have a gate electrode covering said third gate electrode.

15. A semiconductor device according to claim 13, wherein said impurity region is in contact with said channel region.

16. A semiconductor device according to claim 13, wherein said impurity region contains an impurity element of Group 15 in a concentration of 1×

10¹⁶ to 1×

10¹⁹ atms/cm³.

23. A semiconductor device according to claim 13, wherein said first gate electrode or said third gate electrode is a single layer or multiple layer of a metal or an alloy thereof selected from the group consisting of tantalum (Ta), tantalum nitride (TaN), titanium (Ti), chromium (Cr), tungsten (W), molybdenum (Mo), silicon (Si), aluminum (Al), and copper (Cu).

24. A semiconductor device according to claim 13, wherein the material of said second gate electrode is different from that of said first gate electrode.

31. A semiconductor device according to claim 13, wherein said semiconductor device is a display device using an organic electroluminescence material.

32. A semiconductor device according to claim 13, wherein said semiconductor device is incorporated into an electric equipment selected from the group consisting of a personal computer, a video camera, a portable information terminal, a digital camera, a digital versatile disk player, a goggle type display, and a projector.

33. An electroluminescence display device comprising:

a pixel portion and a peripheral driving circuit portion formed over a substrate having an insulating surface;

at least a first thin film transistor for controlling current and a second thin film transistor for switching each being formed in the pixel portion;

at least a CMOS transistor formed in the peripheral driving circuit portion;

wherein said first thin film transistor includes;

a first semiconductor film formed over the substrate;

a first gate electrode adjacent to said first semiconductor film with a gate insulating film interposed therebetween;

a second gate electrode covering said first gate electrode and being in contact with said gate electrode;

a channel region formed in said first semiconductor film and overlapping with the region in contact with said gate insulating film of said first gate electrode, with said gate insulating film interposed therebetween;

at least one impurity region formed in said first impurity region and overlapping with the region in contact with said gate insulating film of said second gate electrode, with said gate insulating interposed therebetween;

a pixel electrode being electrically connected to said impurity region of said first thin film transistor,

wherein said second thin film transistor comprising;

a second semiconductor film formed over the substrate;

a third gate electrode adjacent to said second semiconductor film with said gate insulating film interposed therebetween;

at least one impurity in said second semiconductor film not overlapping with said third gate electrode, and

a light emitting layer being formed over the pixel electrode, an electrode being formed over the light emitting layer.

34. An electroluminescence display device according to claim 33 wherein said light emitting layer is an EL layer.

35. An electroluminescence display device according to claim 33, wherein at least one of the pixel electrode and the electrode is transparent.

36. An electroluminescence display device according to claim 33, wherein said electroluminescence display device is incorporated into an electric equipment selected from the group consisting of a personal computer, a video camera, a portable information terminal, a digital camera, a digital versatile disk player, a goggle type display, and a projector.