Method for monitoring alternating current discharge on a double electrode and apparatus

• US 6,420,863 B1
• Filed: 06/21/2000
• Issued: 07/16/2002
• Est. Priority Date: 10/22/1998
• Status: Expired due to Fees

• Current Assignee: TRUMPF Hüttinger GmbH + Co. KG (Trumpf GmbH + Company KG)
• Original Assignee: Fraunhofer Gesellschaft Zur Foerderung Der Angewandten Forsching E.V.
• Inventors: Fickert, Andreas, Fahland, Matthias, Winkler, Torsten, Milde, Falk, Kirchhoff, Volker
• Primary Examiner(s): Sherry, Michael J.
• Assistant Examiner(s): Amin, Anand B.
• Application Number:
  US09/581,208
• Time in Patent Office: 755 Days
• Field of Search: 324/771, 324/76.13, 324/76.76, 324/464, 324/536, 324/71.1, 702/58, 204/298.08, 204/298, 219/69.16, 250/492.3
• US Class Current: 324/76.76
• CPC Class Codes: H01J 37/3405 Magnetron sputtering
• CPC Class Codes: H01J 37/3444 Associated circuits
• CPC Class Codes: H05H 1/0081 by electric means

Abstract

Process for monitoring an alternating-voltage discharge between the electrodes of a double electrode and an apparatus. The process includes measuring values of at least one of a discharge current and a discharge voltage for each half-wave within an alternating-voltage discharge period, determining a difference between the measured values of a second half-wave and the measured values of the first half-wave, and comparing the determined differences to specific tolerance values. When the specific tolerance values are exceeded by the determined differences, a power supply is reduced, whereby the discharge is at least briefly suppressed. The apparatus includes a double magnetron including first and second targets arranged to form a double electrode, and a power supply coupled to supply power to the first and second targets. The power supply includes a measurement unit for measuring values of at least one of discharge current and discharge voltage, such that at least one of a discharge current and a discharge voltage for each half-wave within an alternating-voltage discharge period is measured. A device for determining a difference between the measured values of a second half-wave and the measured values of the first half-wave is provided, as well as a device for comparing the determined differences to specific tolerance values, and a device for at least briefly suppressing the discharge when the specific tolerance values are exceeded by the determined differences.

Claims

1. A process for monitoring an-alternating-voltage discharge between the electrodes of a double electrode, comprising:

measuring values of at least one of a discharge current and a discharge voltage for each half-wave within an alternating-voltage discharge period;

determining a difference between the measured values of a second half-wave and the measured values of the first half-wave;

comparing the determined differences to specific tolerance values,

wherein, when the specific tolerance values are exceeded by the determined differences, a power supply is reduced, whereby the discharge is at least briefly suppressed.

2. The process in accordance with claim 1, wherein the first half-wave value is the positive current.

3. The process in accordance with claim 1, wherein the determined difference is a difference between one-half of a magnitude of the at least one of the discharge current and the discharge voltage between a peak of the first half-wave and a peak of the second half-wave and the measured value of the second half-wave of the at least one of the discharge current and the discharge voltage.

4. The process in accordance with claim 1, wherein the determined difference is a difference between one-half of a total discharge current between peak values of the first and second half-waves and the measured value of the second half-wave of the discharge current.

5. The process in accordance with claim 1, wherein the determined difference is a difference between one-half of a total discharge voltage between peak values of the first and second half-waves and the measured value of the second half-wave of the discharge voltage.

6. The process in accordance with claim 1, wherein the determined difference is determined from ratio values of different measured values of the measured half-waves to specific ratio tolerance values.

7. The process in accordance with claim 1, wherein the determined difference between one or more periods and the determined difference between one or more preceding periods are compared to specific tolerance values.

8. The process in accordance with claim 1, wherein an average of determined differences of one or more periods are compared to the specific tolerance values.

9. The process in accordance with claim 1, wherein at least one of a total discharge current and a total discharge voltage between peaks of the first and the second half-waves remain substantially constant.

10. A process for monitoring an alternating-voltage discharge between the electrodes of a double electrode, comprising:

measuring values of at least one of a discharge current and a discharge voltage for each half-wave within an alternating-voltage discharge period;

determining a difference between the measured values of a second half-wave and the measured values of the first half-wave;

comparing the determined differences to specific tolerance values,

wherein, when the specific tolerance values are exceeded by the determined differences, a power supply is reduced, whereby the discharge is at least briefly suppressed, and

wherein the alternative-voltage discharge is monitored between two targets for cathodic sputtering.

11. An apparatus comprising:

a double magnetron comprising first and second targets arranged to form a double electrode;

a power supply coupled to supply power to said first and second targets, said power supply comprising a measurement unit for measuring values of at least one of discharge current and discharge voltage, whereby at least one of a discharge current and a discharge voltage for each half-wave within an alternating-voltage discharge period is measured;

a device for determining a difference between the measured values of a second half-wave and the measured values of the first half-wave;

a device for comparing the determined differences to specific tolerance values; and

a device for at least briefly suppressing the discharge when the specific tolerance values are exceeded by the determined differences.

12. The apparatus in accordance with claim 11, further comprising a switching element coupled between said power supply and said first and second targets.

13. The apparatus in accordance with claim 12, wherein said switching element comprises a measuring element for recording a duration of said half-waves.

14. The apparatus in accordance with claim 11, wherein said first and second targets comprise titanium.

15. The apparatus in accordance with claim 11, wherein said first and second targets have an overall electrode area of 12,000 cm².

16. The apparatus in accordance with claim 11, further comprising a vacuum chamber within which the double magnetron is located.

17. The apparatus in accordance with claim 16, wherein the vacuum chamber includes inlets for forming a reactive oxygen atmosphere within the vacuum chamber, and a working pressure of 3×

10<sup>−

1</sup> Pa is exerted within the vacuum chamber.

18. The apparatus in accordance with claim 11, wherein the device for at least briefly suppressing the discharge comprises a device for reducing the power supplied to the first and second targets by the power supply.