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Chemical vapor deposition apparatus with liquid feed

  • US 6,428,623 B2
  • Filed: 06/15/1998
  • Issued: 08/06/2002
  • Est. Priority Date: 05/14/1993
  • Status: Expired due to Fees
First Claim
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1. A liquid source chemical vapor deposition system, comprising:

  • a solution chamber containing a solution, the solution comprising a nonvolatile precursor dissolved in a liquid solvent, the solution chamber adapted to be maintained at a pressure and a temperature sufficient to keep the solution in a liquid state;

    a chemical vapor deposition chamber;

    a transport device adapted to deliver the solution from the solution chamber to a nebulizer within the chemical vapor deposition chamber, the transport device adapted to be maintained at a pressure and temperature sufficient to keep the solution in a liquid state, the transport device adapted to transport the solution as a continuous liquid stream from the solution chamber to the chemical deposition chamber and to deliver the continuous liquid stream to the nebulizer in the chemical vapor deposition chamber; and

    wherein the liquid solvent is selected from the group consisting of liquid ammonia, liquid NO2, liquid SO2, liquid TiCl4, liquid xenonflourides, liquid phosphine, liquid arsine, diethylzinc, BCl3, BF3, SF6, H2S, SiF4, CBrF3, CCl2F2, CCl3F, CClF3, CCl4, and SiH2Cl2.

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