MEMS sensor structure and microfabrication process therefor

• US 6,428,713 B1
• Filed: 10/01/1999
• Issued: 08/06/2002
• Est. Priority Date: 10/01/1999
• Status: Expired due to Term

• Current Assignee: Google LLC (Alphabet Inc.)
• Original Assignee: Delphi Technologies, Inc. (BorgWarner Incorporated)
• Inventors: Christenson, John Carl, Rich, David Boyd, Staller, Steven Edward, Healton, Robert Lawrence, Freeman, John Emmett, Chase, Troy Allan
• Primary Examiner(s): Powell, William A.
• Application Number:
  US09/410,713
• Time in Patent Office: 1,040 Days
• Field of Search: 216/2, 216/33, 216/41, 216/59, 216/67, 216/79, 438/14, 438/719, 438/723, 438/735, 438/743, 735/17.R, 735/17.A
• US Class Current: 216/2
• CPC Class Codes: B81B 2201/0235 Accelerometers
• CPC Class Codes: B81C 1/0019 Flexible or deformable structures not provided for in groups B81C1/00142 - B81C1/00182
• CPC Class Codes: B81C 2201/014 by depositing an etch stop layer, e.g. silicon nitride, silicon oxide, metal
• CPC Class Codes: B81C 2201/019 Bonding or gluing multiple substrate layers

Abstract

A micro-electro-mechanical structure including a semiconductor layer mounted to an annular support structure via an isolation layer wherein the semiconductor layer is micromachined to form a suspended body having a plurality of suspension projections extending from the body to the rim and groups of integral projections extending toward but spaced from the rim between said suspension projections. Each projection in said groups has a base attached to the body and a tip proximate the rim. The structure includes a plurality of inward projections extending from and supported on the rim and toward the body. Each such projection has a base attached to the rim and a tip proximate the body; wherein the grouped projections and the inward projections are arranged in an interdigitated fashion to define a plurality of proximate projection pairs independent of the suspension elements such that a primary capacitive gap is defined between the projections of each projection pair. Also, a process is disclosed for fabricating the micro-electro-mechanical structure including the steps of removing a highly doped etch termination layer and thereafter etching through a lightly doped epitaxial layer to thereby define and release the structure.

Claims

1. A process for fabricating a micro-electro-mechanical structure having interdigitated projections, said process comprising the steps of:

providing a first substrate;

etching a cavity within said first substrate;

forming an isolation layer on said first substrate;

providing a second substrate;

doping the top portion of said second substrate to thereby form an etch termination layer;

forming a doped epitaxial layer on the etch termination layer portion of said second substrate such that said etch termination layer portion of said second substrate has a higher doping concentration than said epitaxial layer;

bonding said second substrate to said first substrate such that said epitaxial layer covers said cavity and is bonded to said isolation layer at the periphery of said cavity;

removing the non-termination layer portion of said second substrate from said etch termination layer portion of said second substrate;

removing said etch termination layer portion of said second substrate from said epitaxial layer;

applying photoresist on said epitaxial layer;

patterning said photoresist according to a shape of said micro-electro-mechanical structure;

anisotropically etching through sections of said epitaxial layer disposed over said cavity and revealed through said patterned photoresist to thereby define and release said micro-electro-mechanical structure above said cavity; and

removing said patterned photoresist.

2. The process according to claim 1, wherein said top portion of said second substrate is doped with a p-type dopant comprising boron and germanium.

3. The process according to claim 1, wherein said epitaxial layer is doped with a p-type dopant.

4. The process according to claim 1, wherein the photoresist is a positive photoresist.

5. The process according to claim 1, wherein the step of anisotropically etching through said epitaxial layer is accomplished by contacting said epitaxial layer with a plasma comprising sulfur hexafluoride and oxygen.

6. The process according to claim 5, wherein the step of anisotropically etching through said epitaxial layer includes cooling the epitaxial layer to a cryogenic temperature of less than about 173EK.

7. The process according to claim 1, wherein the step of anisotropically etching through said epitaxial layer is accomplished by a pulsed halogen and carbon compound-forming gas process.

8. The process according to claim 7, wherein the step of anisotropically etching through said epitaxial layer is performed at room temperature.

9. The process according to claim 1, wherein said first substrate and said second substrate comprise silicon, and wherein said isolation layer comprises silicon dioxide.

10. The process according to claim 1, wherein the step of patterning said photoresist according to a shape of said micro-electro-mechanical structure includes the steps of:

determining a minimum capacitive gap between said interdigitated projections of said micro-electro-mechanical structure which are nearest to each other, wherein each projection of said interdigitated projections has a base and a tip at opposite ends;

defining said shape such that each of said projection of said interdigitated projections is proximate to at least one tip of another said projection of said interdigitated projections by a distance substantially equal to said minimum capacitive gap; and

selectively removing said photoresist to reveal bare sections of said epitaxial layer according to said shape.