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Method for joining an integrated circuit

  • US 6,434,817 B1
  • Filed: 12/03/1999
  • Issued: 08/20/2002
  • Est. Priority Date: 12/03/1999
  • Status: Expired due to Fees
First Claim
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1. A method for forming a contact bump, the method comprising:

  • forming a conductive material to have a height of between approximately 0.001 inch and approximately 0.008 inch;

    forming the conductive material to have a base width of between approximately 0.001 inch and approximately 0.010 inch;

    forming the conductive material to have a slope angle of between approximately 40 degrees and approximately 80 degrees;

    forming the conductive material to have a tip radius of between approximately 0.001 inch and approximately 0.030 inch; and

    wherein the height, width, slope angle, and tip radius interact to produce the bump having a shape which mitigates local stress buildup.

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