Process device
First Claim
1. A process device, comprising:
- a generally cylindrical chamber accommodating a substrate to be processed;
an energy supply, disposed in the chamber, for supplying energy to a gas introduced in the chamber to convert the gas into a plasma-state gas;
a dipole ring magnet, having portions disposed cylindrically surrounding the chamber, on an outer periphery of the cylinder a plurality of magnets being disposed, the dipole ring magnet be rotated in one direction around an axis passing through a center portion of the bottom of the cylinder;
a shield plate disposed surrounding a circumference of the dipole ring magnet and supported rotatable coaxially with a rotation axis of the dipole ring magnet; and
a shield plate rotation mechanism which rotates the shield plate in a direction opposite to that of the dipole ring magnet.
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Accused Products
Abstract
A process device and a method for processing a substrate. A dipole ring magnet (DRM) is arranged in a manner so that a leakage magnetic field in the neighborhood of the process device and at a position a prescribed distance therefrom is minimized. The dipole ring magnet (DRM) rotates around an outer periphery of a process chamber which has a plasma generation device, a substantially cylindrical shield plate covering an outer periphery of the dipole ring magnet. The shield is rotated coaxially with the dipole ring magnet and in a direction opposite to the rotation of the dipole ring magnet. In this way a magnetic field is generated in a direction that cancels leakage magnetic flux generated outside the dipole ring magnet.
84 Citations
20 Claims
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1. A process device, comprising:
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a generally cylindrical chamber accommodating a substrate to be processed;
an energy supply, disposed in the chamber, for supplying energy to a gas introduced in the chamber to convert the gas into a plasma-state gas;
a dipole ring magnet, having portions disposed cylindrically surrounding the chamber, on an outer periphery of the cylinder a plurality of magnets being disposed, the dipole ring magnet be rotated in one direction around an axis passing through a center portion of the bottom of the cylinder;
a shield plate disposed surrounding a circumference of the dipole ring magnet and supported rotatable coaxially with a rotation axis of the dipole ring magnet; and
a shield plate rotation mechanism which rotates the shield plate in a direction opposite to that of the dipole ring magnet. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11)
an external ear disposed on an outer periphery surface of the dipole ring magnet;
an internal gear disposed on an inner periphery surface of the shield plate; and
a pinion gear engaging with the external gear and the internal gear.
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4. The process device as set forth in claim 2 wherein the shield plate has a plurality of minute through holes bored therethrough.
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5. The process device as set forth in claim 1 wherein the shield plate rotation mechanism rotates the shield plate with a rotational speed controllably set independently from a rotation of the dipole ring magnet.
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6. The process device as set fort in claim 5 wherein the shield plate rotation mechanism comprises a dedicated motor disposed for the rotation thereof.
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7. The process device as set forth in claim 6, further comprising a sensor at a secluded position outside the shield plate for detecting a magnetic flux density, and wherein the rotation of the motor is controlled based on the detected magnetic flux density.
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8. The process device as set forth in claim 6 wherein the shield plate has a plurality of minute through holes bored therethrough.
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9. The process device as set forth in claim 5, further comprising a sensor at a secluded position outside the shield plate for detecting a magnetic flux density, and wherein the shield plate rotation mechanism controls the rotational speed of the shield plate based on the detected magnetic flux density.
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10. The process device as set forth in claim 5 wherein the shield plate has a plurality of minute through holes bored therethrough.
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11. The process device as set forth in claim 1 wherein the shield plate has a plurality of minute through holes bored therethrough.
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12. A process device, comprising:
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a process chamber where processing of a substrate can be performed, the process chamber having a chamber wall;
a conductive member, disposed in the process chamber, for supplying energy to a gas introduced in the chamber to convert the gas into a plasma-state gas;
a dipole ring magnet, having portions disposed cylindrically about the chamber, for generating a magnetic field in the chamber, the dipole ring magnet rotating in one direction around an axis of the cylinder through a central portion of the bottom of the cylinder;
a shield plate disposed surrounding a circumference of the dipole ring magnet and supported rotatably without coming into contact with the dipole ring magnet; and
a shield plate rotation mechanism which rotates the shield plate so as to suppress magnetic flux leaking outside the dipole ring magnet. - View Dependent Claims (13, 14, 15, 16, 17, 18)
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19. A process device, comprising:
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process chamber for processing a substrate;
energy supplying means, disposed in the process chamber, for supplying energy to a gas to convert the gas into a plasma-state gas;
magnetic field generating means, having portions disposed surrounding the process chamber and rotatable around an axis of the chamber that passes through a central portion of the bottom of the chamber, for generating a magnetic field in the process chamber;
magnetic flux shielding means, disposed surrounding a circumference of the magnetic field generating means without coming into contact therewith, for shielding magnetic flux leaking outside the magnetic field generating means; and
rotating means for rotating the magnetic flux shielding means so that the magnetic flux is suppressed from leaking. - View Dependent Claims (20)
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Specification