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Photolithographic apparatus composed of coater/developer and a plurality of steppers in parallel connected thereto

  • US 6,436,609 B1
  • Filed: 05/04/2000
  • Issued: 08/20/2002
  • Est. Priority Date: 08/20/1997
  • Status: Expired due to Fees
First Claim
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1. A photolithographic process for manufacturing semiconductor devices, comprising:

  • providing a single coater for coating a photoresist film on semiconductor wafers, a single developer and a plurality of steppers, the plurality of steppers parallel-connected to said single coater and said single developer;

    coating a plurality of uncoated semiconductor wafers in said single coater;

    transmitting said plurality of coated semiconductor wafers to said plurality of steppers;

    parallel-exposing said plurality of coated semiconductor wafers in at least two of said plurality of steppers parallel-connected to said single coater and said single developer to a photolithographic pattern; and

    developing said predetermined photolithographic pattern in said single developer thereby increasing the speed of said photolithographic processing of the semiconductor wafers.

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