Methods and materials for selective modification of photopatterned polymer films

• US 6,436,615 B1
• Filed: 06/25/1999
• Issued: 08/20/2002
• Est. Priority Date: 06/25/1999
• Status: Expired due to Fees

• Current Assignee: the united states of america as represented by the secretary of the navy
• Original Assignee: the united states of america as represented by the secretary of the navy
• Inventors: Dressick, Walter M., Dulcey, Charles S., Calvert, Jeffrey M., Brandow, Susan L.
• Primary Examiner(s): Duda, Kathleen
• Application Number:
  US09/339,917
• Time in Patent Office: 1,152 Days
• Field of Search: 430/324, 430/322, 430/325, 430/296, 427/304, 427/305, 427/437
• US Class Current: 430/324
• CPC Class Codes: G03F 7/165 Monolayers, e.g. Langmuir-Blodgett
• CPC Class Codes: G03F 7/26 Processing photosensitive materials; Apparatus therefor G03F7/12 - G03F7/24 take precedence
• CPC Class Codes: G03F 7/265 Selective reaction with inorganic or organometallic reagents after image-wise exposure, e.g. silylation
• CPC Class Codes: H05K 3/185 by making a catalytic pattern by photo-imaging

Abstract

An aspect of the present invention is a process for modifying a substrate in areas that are exposed to actinic radiation, having the steps: (a) providing on the substrate functional groups adapted for conversion to oxygen-containing photoproducts upon exposure to actinic radiation; (b) exposing at least a portion of the substrate to the actinic radiation, converting the functional groups in an exposed region of the substrate to the photoproducts; (c) contacting the photoproducts with a primary or secondary amine in the presence of hydrogen ions, forming imine groups; and (d) contacting the imine groups with a reducing agent, forming amine groups on the substrate in the exposed region. Another aspect of the present invention is a process for modifying a substrate in areas that are unexposed to actinic radiation, having the steps: (a) providing on the substrate aryl functional groups adapted for conversion to oxygen-containing photoproducts upon exposure to actinic radiation; (b) exposing a portion of the substrate to the actinic radiation, converting the aryl functional groups in an exposed region of the substrate to the photoproducts, and not converting the aryl functional groups in an unexposed region of the substrate to the photoproducts; (c) contacting the aryl functional groups in the unexposed region of the substrate with a compound adapted for physisorption to the aryl functional groups, preferentially physisorbing the compound onto the substrate in the unexposed regions.

Claims

1. A process for modifying a substrate, comprising the steps:

(a) providing on said substrate functional groups adapted for conversion to oxygen-containing photoproducts upon exposure to actinic radiation;

(b) exposing at least a portion of said substrate to said actinic radiation, thereby converting said functional groups in an exposed region of said substrate to said photoproducts;

(c) contacting said photoproducts with a primary or secondary amine in the presence of hydrogen ions, thereby forming imine groups; and

(d) contacting said imine groups with a reducing agent, thereby forming amine groups on said substrate in said exposed region.

2. The process of claim 1, wherein said conversion is a direct conversion from said functional groups to said photoproducts.

3. The process of claim 1, wherein said conversion is an indirect conversion from said functional groups to one or more intermediate products to said photoproducts.

4. The process of claim 1, wherein said actinic radiation is selected from the group consisting of ultraviolet radiation, electrons, ions, and x-ray radiation.

5. The process of claim 1, wherein said photoproducts are selected from the group consisting of aldehydes, ketones, alcohols, and acids.

6. The process of claim 1, wherein said functional groups adapted for conversion to photoproducts are selected from the group consisting of organic halides and organic pseudohalides.

7. The process of claim 1, wherein said functional groups adapted for conversion to photoproducts have the general formula —

Ar—

(CH₂X)_n, wherein Ar is an aryl group, X is selected from the group consisting of chloride, bromide, fluoride, acetate (OAc), trifluoromethanesulfonate (OTf), methanesulfonate, toluenesulfonate, sulfonate, tosylate, azide, cyanide, isocyanide, thiocyanate, isothiocyanate, and thiosulfate, and n is an integer between 1 and 5, inclusive.

8. The process of claim 1, wherein said functional groups adapted for conversion to photoproducts are groups in a polymer film.

9. The process of claim 8, wherein said groups in said polymer film are polymer backbone groups.

10. The process of claim 8, wherein said groups in said polymer film are polymer pendant groups.

11. The process of claim 8, wherein said polymer film is a coating on said substrate.

12. The process of claim 8, wherein said polymer film is a component in a mixture of polymers forming a coating on said substrate.

13. The process of claim 8, wherein said polymer film comprises a polyvinyl benzyl halide or polyvinyl benzyl pseudohalide.

14. The process of claim 1, wherein said amine groups have the general formula —

NRR², wherein said R is a moiety to impart a selected property to said substrate, and said R² is hydrogen or an independently selected moiety to impart a selected property to said substrate, wherein said R is selected from the group consisting of antibodies, haptens, nucleic acid strands, polypeptides, proteins, chromophores, fluorophores, ligands, and hydrogen.

15. The process of claim 14, wherein R and R² are hydrogen, and wherein said amine in step (c) of claim 1 is NH₄OAc.

16. The process of claim 1, wherein said amine groups are polyamidoamine dendrimers.

17. The process of claim 1, wherein said reducing agent is a selective reducing agent for said imine bond.

18. The process of claim 1, wherein said reducing agent is a reducing agent to reduce said imine groups to said amine groups.

19. The process of claim 1, wherein said reducing agent is NaBH₃CN.

20. The process of claim 1, wherein said photoproducts are selected from the group consisting of aldehydes and acids, and further comprising:

(e) depositing metal on said amine groups by a method selected from the group consisting of;

(i) contacting said amine groups with a metallization catalyst and subsequently with an electroless plating solution, thereby forming a metal coating on said exposed region; and

(ii) depositing said metal on said amine groups by chemical vapor deposition.

21. The process of claim 20, wherein said electroless plating solution is a plating solution for the deposition of metal wherein said metal in said electroless plating solution is selected from the group consisting of nickel, gold, copper, silver, platinum, palladium, cobalt, iron, zinc, rhenium and combinations thereof.

22. The process of claim 21, wherein said steps (c) and (d) are performed concurrently.

23. The process of claim 21, wherein said step (c) is performed prior to step (d).

24. A process for metallizing a substrate, comprising the steps:

(a) providing on said substrate functional groups adapted for conversion to photoproducts selected from the group consisting of aldehydes and acids upon exposure to actinic radiation;

(b) exposing at least a portion of said substrate to said actinic radiation, thereby converting said functional groups in an exposed region of said substrate to said photoproducts;

(c) contacting said photoproducts with a primary or secondary amine in the presence of hydrogen ions, thereby forming imine groups;

(d) contacting said imine groups with a reducing agent, thereby forming amine groups on said substrate in said exposed region; and

(e) depositing a metal on said amine groups by chemical vapor deposition.

25. A process for modifying a substrate, comprising the steps:

(a) providing on said substrate aryl functional groups adapted for conversion to oxygen-containing photoproducts upon exposure to actinic radiation;

(b) exposing a portion of said substrate to said actinic radiation, thereby converting said aryl functional groups in an exposed region of said substrate to said photoproducts, and not converting said aryl functional groups in an unexposed region of said substrate to said photoproducts;

(c) contacting said aryl functional groups in said unexposed region of said substrate with a compound adapted for physisorption to said aryl functional groups, thereby physisorbing said compound onto said substrate in said unexposed regions.

26. The process of claim 25, wherein said compound adapted for physisorption to said aryl functional groups is aliphatic.

27. The process of claim 25 wherein said compound adapted for physisorption to said aryl functional groups is a borane complex of an aliphatic or aromatic amine.

28. The process of claim 25 wherein said compound adapted for physisorption to said aryl functional groups is selected from the group consisting of dimethylamineborane, borane-4-methylmorpholine complex, borane-piperidine complex, 4-(borane-dimethylamino pyridine), borane trimethylamine complex, borane pyridine complex, pyridine, 4,4′

-bipyridine, and 2,2′

-bipyridine.

29. The process of claim 25, wherein said actinic radiation is selected from the group consisting of ultraviolet radiation, high voltage electrons, tunneling voltage electrons, ions, and x-ray radiation, wherein high voltage electrons are electron beams accelerated by a potential difference of ≧

5KY.

30. The process of claim 25, wherein said compound adapted for physisorption to said aryl functional groups has a general formula selected from the group consisting of Ar¹—

R¹ and R³—

R¹, wherein said Ar¹ is an aryl moiety, said R³ is an aliphatic moiety, and said R¹ is an —

N containing group.

31. The process of claim 30, wherein said R¹ binds a metallization catalyst.

32. The process of claim 25, wherein said step of contacting said aryl functional groups in said unexposed region of said substrate with said compound adapted for physisorption to said aryl functional groups is performed in a polar solution.

33. The process of claim 32, wherein said polar solution is selected from the group consisting of aqueous solutions and alcoholic solutions.

34. The process of claim 25, wherein said compound adapted for physisorption to said aryl functional groups has the general formula Ar², wherein said Ar² is an aryl moiety and further imparts a selected property to said substrate.

35. The process of claim 34, wherein said Ar² binds a metallization catalyst.

36. The process of claim 34, wherein said Ar² is pyridine absorbates having a solubility ≧

1 mmole/liter.

37. The process of claim 34, wherein said physisorption of said Ar² is stable under a vacuum of 10⁻

6 torr or lower.

38. The process of claim 25, wherein said exposing step is conducted prior to said physisorbing step.

39. The process of claim 25, wherein said exposing step is conducted after said physisorbing step.

40. The process of claim 25, wherein said functional groups adapted for conversion to photo-products are bound to said substrate through siloxane linkages, and have the general formula —

Ar—

(CH₂X)_n, wherein Ar is an aryl group, X is selected from the group consisting of chloride, bromide, fluoride, acetate (OAc), trifluoromethanesulfonate (OTf), methanesulfonate, toluenesulfonate, sulfonate, tosylate, azide, cyanide, isocyanide, thiocyanate, isothiocyanate, and thiosulfate, and n is an integer between 1 and 5, inclusive.

41. The process of claim 40, wherein n=1.

42. The process of claim 25, wherein said functional groups adapted for conversion to photo-products are groups in a polymer film, and have the general formula —

Ar—

(CH₂X)_n, wherein Ar is an aryl group, X is selected from the group consisting of chloride, bromide, fluoride, acetate (OAc), trifluoromethanesulfonate (OTf), methanesulfonate, toluenesulfonate, sulfonate, tosylate, azide, cyanide, isocyanide, thiocyanate, isothiocyanate, and thiosulfate, and n is an integer between 1 and 5, inclusive.

43. The process of claim 42, wherein said wherein said groups in said polymer film are polymer backbone groups, and n is an integer between 1 and 4, inclusive.

44. The process of claim 42, wherein said wherein said groups in said polymer film are polymer pendant groups.

45. The process of claim 25, wherein said actinic radiation cleaves Si—

C bonds in said exposed region, thereby producing Si—

OH groups on said substrate.

46. A process for modifying a substrate, comprising the steps:

(a) providing on said substrate functional groups selected for physisorbing pyrrole;

(b) contacting said functional groups with pyrrole, thereby physisorbing said pyrrole onto said substrate;

(c) contacting said physisorbed pyrrole with an oxidant solution for initiating polymerization in said pyrrole, thereby polymerizing said pyrrole.

47. The process of claim 46, wherein said oxidant solution is an Fe(III) solution.

48. The process of claim 46, wherein said oxidant solution further comprises at least one dopant selected from the group consisting of anthraquinone-2-sulfonic acid sodium salt monohydrate and 5-sulfosalicylic acid dihydrate.