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Methods and materials for selective modification of photopatterned polymer films

  • US 6,436,615 B1
  • Filed: 06/25/1999
  • Issued: 08/20/2002
  • Est. Priority Date: 06/25/1999
  • Status: Expired due to Fees
First Claim
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1. A process for modifying a substrate, comprising the steps:

  • (a) providing on said substrate functional groups adapted for conversion to oxygen-containing photoproducts upon exposure to actinic radiation;

    (b) exposing at least a portion of said substrate to said actinic radiation, thereby converting said functional groups in an exposed region of said substrate to said photoproducts;

    (c) contacting said photoproducts with a primary or secondary amine in the presence of hydrogen ions, thereby forming imine groups; and

    (d) contacting said imine groups with a reducing agent, thereby forming amine groups on said substrate in said exposed region.

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