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Nitrogen treatment of a metal nitride/metal stack

  • US 6,436,819 B1
  • Filed: 02/01/2000
  • Issued: 08/20/2002
  • Est. Priority Date: 02/01/2000
  • Status: Expired due to Term
First Claim
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1. A method of processing a substrate, comprising the steps of:

  • (a) depositing a nitride layer upon a metal layer to form an interface between said nitride layer and said metal layer, wherein said nitride layer is formed in the presence of a metallo-organic compound comprising titanium;

    (b) providing a nitrogen/hydrogen-containing environment; and

    (c) modifying said nitride layer and at least a portion of said metal layer below said interface by exposing said nitride layer to said nitrogen/hydrogen-containing environment.

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