Vaporization of precursors at point of use

• US 6,443,435 B1
• Filed: 10/23/2000
• Issued: 09/03/2002
• Est. Priority Date: 10/23/2000
• Status: Expired due to Fees

• Current Assignee: Applied Materials Incorporated
• Original Assignee: Applied Materials Incorporated
• Inventors: Hendrickson, Scott
• Primary Examiner(s): Bushey, C. Scott
• Application Number:
  US09/695,488
• Time in Patent Office: 680 Days
• Field of Search: 261/35, 261/42, 261/72.1, 261/142, 261/128, 261/131, 261/141, 261/DIG.65
• US Class Current: 261/128
• CPC Class Codes: C23C 16/4485 by evaporation without using carrier gas in contact with the source material C23C16/4486 takes precedence
• CPC Class Codes: H01J 37/3244 Gas supply means
• CPC Class Codes: Y10S 261/65 Vaporizers

Abstract

An apparatus and method for vaporizing and delivering liquid precursors to a processing chamber is provided. In one aspect, the apparatus is a liquid delivery system including a liquid supply, a vaporization assembly fluidicly coupled to the liquid supply, the vaporization assembly consisting essentially of an ampoule and a mass flow controller connected to the ampoule, and a processing chamber fluidicly coupled to the vaporization assembly. The liquid precursor is vaporized in the ampoule. In a preferred embodiment, the ampoule is located adjacent the processing chamber to provide point of use vaporization of the liquid precursor. In another aspect, the method includes providing a liquid supply containing a liquid precursor, delivering the precursor to an ampoule, vaporizing a portion of the liquid precursor in the ampoule, and flowing vaporized precursor to a processing chamber.

Claims

1. A method for vaporizing a liquid precursor for delivery to a processing chamber, comprising:

providing a liquid supply containing a liquid precursor and an ampoule coupled to the liquid supply;

delivering the liquid precursor to the ampoule, wherein delivering the liquid precursor to the ampoule comprises pressurizing the liquid supply by a thermal process to a first pressure higher than a second pressure in the ampoule and flowing the liquid precursor to the ampoule by a first pressure differential;

vaporizing a portion of the liquid precursor in the ampoule; and

flowing vaporized precursor to a processing chamber coupled to the ampoule.

2. The method of claim 1, wherein the thermal process heats the liquid precursor to a temperature above a vaporization temperature of the liquid precursor.

3. The method of claim 1, wherein the first pressure is between about 15 psi and about 25 psi.

4. The method of claim 1, wherein the first pressure differential delivers the liquid precursor to the ampoule at a flow rate between about 65 sccm and about 3000 sccm.

5. The method of claim 1, wherein the liquid precursor has a vapor pressure of about 1000 Torr or greater at a temperature between about 20°

C. and about 25°

C.

6. The method of claim 1, wherein the thermal process comprises heating the liquid supply to a temperature of between about 30°

C. and about 40°

C.

7. The method of claim 1, wherein vaporizing a portion of the liquid precursor in the ampoule comprises maintaining the ampoule at a temperature between about 20°

C. and about 25°

C.

8. The method of claim 2, wherein the second pressure is between about 1 psi and about 10 psi.

9. The method of claim 1, wherein the vaporized precursor flows at a rate between about 65 sccm and about 3000 sccm to the processing chamber.

10. The method of claim 3, wherein the processing chamber has a third pressure less than the second pressure in the ampoule and vaporized precursor is delivered to the processing chamber by a second pressure differential.

11. The method of claim 10, wherein the processing chamber has a chamber pressure about 200 Torr or less.

12. The method of claim 1, wherein the liquid precursor comprises an organic material.

13. A method for vaporizing a liquid precursor for delivery to a processing chamber, comprising:

providing a liquid supply containing a liquid precursor and an ampoule coupled to the liquid supply;

heating the liquid supply to a first temperature above a vaporization temperature of the liquid precursor to provide a first pressure in the liquid supply;

operating the ampoule at a second pressure lower than the first pressure and at a second temperature less than the first temperature;

flowing the liquid precursor from the liquid supply to the ampoule by a first pressure differential between the first pressure and the second pressure;

vaporizing a portion of the liquid precursor in the ampoule;

operating a processing chamber coupled to the ampoule at a third pressure lower than the second pressure; and

flowing vaporized precursor from the ampoule to the processing chamber by a second pressure differential between the second pressure and the third pressure.

14. The method of claim 13, wherein the first pressure is between about 15 psi and about 25 psi.

15. The method of claim 13, wherein the liquid precursor flows to the ampoule at a flow rate between about 65 sccm and about 3000 sccm.

16. The method of claim 13, wherein the liquid precursor has a vapor pressure of about 1000 Torr or greater at a temperature between about 20°

C. and about 25°

C.

17. The method of claim 13, wherein the first temperature is between about 30°

C. and about 40°

C.

18. The method of claim 13, wherein the vaporizing a portion of the liquid precursor in the ampoule comprises maintaining the ampoule at a second temperature between about 20°

C. and about 25°

C.

19. The method of claim 13, wherein the second pressure is between about 1 psi and about 10 psi.

20. The method of claim 13, wherein the vaporized precursor flows at a rate between about 65 sccm and about 3000 sccm to the processing chamber.

21. The method of claim 13, wherein the processing chamber has a third pressure of about 200 Torr or less.

22. The method of claim 21, wherein the processing chamber has a chamber pressure of less than about 20 Torr.

23. The method of claim 13, wherein the liquid precursor comprises an organic material.

24. A method for vaporizing a liquid precursor for delivery to a processing chamber, comprising

providing a liquid supply containing a liquid precursor and an ampoule coupled to the liquid supply;

heating the liquid supply to a first temperature above a vaporization temperature of the liquid precursor to provide a first pressure between about 15 psi and about 25 psi in the liquid supply;

flowing the liquid precursor from the liquid supply to the ampoule by maintaining the ampoule at a second pressure between about 1 psi and about 10 psi;

vaporizing a portion of the liquid precursor in the ampoule by operating the ampoule at a second temperature above a vaporization temperature of the liquid precursor; and

flowing vaporized precursor to a processing chamber coupled to the ampoule.

25. The method of claim 24, wherein the liquid precursor has a vapor pressure of about 1000 Torr or greater at a temperature between about 20°

C. and about 25°

C.

26. The method of claim 24, wherein the first temperature is between about 30°

C. and about 40°

C.

27. The method of claim 24, wherein the second temperature is between about 20°

C. and about 25°

C.

28. The method of claim 24, wherein the processing chamber has a pressure of about 200 Torr or less.

29. The method of claim 24, wherein the liquid precursor comprises an organic material.