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Polycrystalline silicon-germanium films for micro-electromechanical systems application

  • US 6,448,622 B1
  • Filed: 07/17/2000
  • Issued: 09/10/2002
  • Est. Priority Date: 01/15/1999
  • Status: Expired due to Term
First Claim
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1. A micro-electromechanical system, comprising:

  • a substrate;

    one or more structural layers of Si1−

    x
    Gex, deposited on the substrate, where 0<

    x≦

    1; and

    one or more transistors formed on the substrate.

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