Balanced positioning system for use lithographic apparatus

• US 6,449,030 B1
• Filed: 12/19/2000
• Issued: 09/10/2002
• Est. Priority Date: 12/21/1999
• Status: Expired due to Term

• Current Assignee: ASML Netherlands BV (ASML Holding NV)
• Original Assignee: ASML Netherlands BV (ASML Holding NV)
• Inventors: Kwan, Yim Bun P.
• Primary Examiner(s): Adams, Russell
• Assistant Examiner(s): NGUYEN, HUNG
• Application Number:
  US09/739,098
• Publication Number:
  US 20020048009A1
• Time in Patent Office: 630 Days
• Field of Search: 355/53, 355/72-76, 310/10, 310/12, 318/640, 318/687, 378/34, 378/35
• US Class Current: 355/72
• CPC Class Codes: G03F 7/70716 Stages
• CPC Class Codes: G03F 7/70766 Reaction force control means, e.g. countermass
• CPC Class Codes: G03F 7/709 Vibration, e.g. vibration detection, compensation, suppression or isolation

Abstract

A balanced positioning system for use in lithographic apparatus having a pair of balance masses which are supported so as to be moveable in at least one degree of freedom, such as Y translation. Oppositely directed drive forces in this degree of freedom act directly between the driven body and the balance masses to rotate the driven body about an axis perpendicular to the one direction. Reaction forces arising from positioning movements result in linear movements of the balance masses and all reaction forces are kept within the balanced positioning system.

Claims

1. A lithographic projection apparatus comprising:

a radiation system which supplies a projection beam of radiation;

a first object table for holding a mask;

a second object table for holding a substrate;

an imaging projection system which images irradiated portions of the mask onto target portions of the substrate;

a balanced object table positioning system which positions at least one of said object tables;

first and second balance masses;

a bearing, supporting said first and second balance masses so as to be substantially free to translate in at least a first direction;

a linear actuator which directly acts between said at least one of said object tables and said first and second balance masses to rotate said at least one of said object tables about an axis perpendicular to said first direction, said actuator being arranged to exert linear forces on said first and second balance masses in opposite directions to effect said rotation of said at least one of said object tables; and

a drift control which limits drift of said balance masses, said drift control comprising a servo control system and an actuator which applies forces to said balance masses biasing the combined center of mass of said balance masses, the object table positioning system and the at least one of said object tables to a desired position.

2. The apparatus according to claim 1,

wherein said drift control has a servo bandwidth at least a factor of five lower than a lowest resonance frequency of the balance masses and a base of the apparatus.

3. The apparatus according to claim 1,

wherein said linear actuator is adapted to translate said at least one of said object tables in said first direction by exerting like-directed forces between said at least one of said object tables and said first and second balance masses.

4. The apparatus according to claim 1,

wherein at least one of said balance masses is also free to move in at least a second direction orthogonal to said first direction.

5. The apparatus according to claim 4,

wherein said at least one of said object tables is mounted on a frame and said linear actuator acts between said frame and said first and second balance masses;

the apparatus further comprising a short stroke actuator acting between said at least one of said object tables and said frame for positioning said at least one of said object tables in at least said second direction with a higher precision than said linear actuator position said frame, wherein said frame is substantially rigidly coupled to said one of said balance masses in said second direction.

6. The apparatus according to claim 4, further comprising:

a second linear actuator between a frame and said at least one of said balance masses to drive said at least one of said object tables in said second direction.

7. The apparatus according to claim 1,

wherein said first direction is substantially parallel to the surface of a mask or substrate held on said second object table.

8. The apparatus according to claim 1, further comprising:

a third balance mass substantially free to move in a direction parallel to said axis and a support member acting between said at least one of said object tables and said third balance mass said support member supporting said at least one of said object tables against gravity and positioning said at least one of said object tables in a direction parallel to said axis.

9. A method of manufacturing a device comprising:

providing a mask bearing a pattern to a first object table;

providing a substrate provided with a radiation-sensitive layer to a second object table;

irradiating portions of the mask and imaging said irradiated portions of the mask onto target portions of said substrate;

positioning at least one of said object tables using a positioning system which includes first and second balance masses free to move in at least one direction and an actuator acting between said at least one of said object tables and said balance masses;

during or prior to said irradiating rotating said at least one of said object tables by exerting oppositely directed forces between it and said first and second balance masses; and

controlling a drift of said balance masses with a drift control by applying forces to said balance masses and biasing the combined center of mass of said balance masses, the positioning system and the at least one of said object tables to a desired position.

10. A semiconductor device manufactured according to the method of claim 9.

11. A lithographic projection apparatus comprising:

a radiation system which supplies a projection beam of radiation;

a first object table for holding a mask;

a second object table for holding a substrate;

an imaging projection system which images irradiated portions of the mask onto target portions of the substrate;

a balanced object table positioning system which positions at least one of said object tables;

first and second balance masses;

a bearing, supporting said first and second balance masses so as to be substantially free to translate in at least a first direction;

a linear actuator which directly acts between said at least one of said object tables and said first and second balance masses to rotate said at least one of said object tables about an axis perpendicular to said first direction, said actuator being arranged to exert linear forces on said first and second balance masses in opposite directions to effect said rotation of said at least one of said object tables;

wherein at least one of said balance masses is also free to move in at least a second direction orthogonal to said first direction; and

said at least one of said object tables is mounted on a frame and said linear actuator acts between said frame and said first and second balance masses;

the apparatus further comprising a short stroke actuator acting between said at least one of said object tables and said frame for positioning said at least one of said object tables in at least said second direction with a higher positioning precision than said actuator position said frame, wherein said frame is substantially rigidly coupled to said one of said balance masses in said second direction.

12. A lithographic projection apparatus comprising:

a radiation system which supplies a projection beam of radiation;

a first object table for holding a mask;

a second object table for holding a substrate;

an imaging projection system which images irradiated portions of the mask onto target portions of the substrate;

a balanced object table positioning system which positions at least one of said object tables;

first and second balance masses;

a bearing, supporting said first and second balance masses so as to be substantially free to translate in at least a first direction;

a linear actuator which directly acts between said at least one of said object tables and said first and second balance masses to rotate said at least one of said object tables about an axis perpendicular to said first direction, said actuator being arranged to exert linear forces on said first and second balance masses in opposite directions to effect said rotation of said at least one of said object tables; and

a third balance mass substantially free to move in a direction parallel to said axis and a support member acting between said at least one of said object tables and said third balance mass said support member supporting said at least one of said object tables against gravity and positioning said at least one of said object tables in a direction parallel to said axis.

13. A lithographic projection apparatus comprising:

a radiation system which supplies a projection beam of radiation;

a first object table for holding a mask;

a second object table for holding a substrate;

an imaging projection system which images irradiated portions of the mask onto target portions of the substrate;

a balanced object table positioning system which positions at least one of said object tables;

first and second balance masses;

a bearing, supporting each of said first and second balance masses such that they are substantially free to translate in at least a first direction;

a respective linear actuator which directly acts between said at least one of said object tables and each of said first and second balance masses to rotate said at least one of said object tables about an axis perpendicular to said first direction, said respective actuator being arranged to exert linear forces on said first and second balance masses in opposite directions to effect said rotation of said at least one of said object tables; and

a drift control which limits drift of said balance masses constructed and arranged to apply a biasing force to the balance masses such that the combined center of mass of the balance masses, the object table positioning system and said at least one of said object tables is biased towards a desired position.

14. An apparatus as in claim 13 wherein said drift control comprises an active system.

15. An apparatus as in claim 14 wherein said drift control comprises a negative-feedback servo system.

16. An apparatus as in claim 13 wherein said drift control comprises a passive system.

17. An apparatus as in claim 16 wherein said drift control comprises at least one spring.

18. A lithographic projection apparatus comprising:

a radiation system which supplies a projection beam of radiation;

a first object table for holding a mask;

a second object table for holding a substrate;

an imaging projection system which images irradiated portions of the mask onto target portions of the substrate;

first and second balance masses;

a balanced object table positioning system which positions at least one of said object tables and at least partially supported by at least one of the balance masses;

a bearing, supporting each of said first and second balance masses such that they are substantially free to translate in at least a first direction; and

a respective linear actuator which directly acts between said at least one of said object tables and each of said first and second balance masses to rotate said at least one of said object tables about an axis perpendicular to said first direction, said respective actuator being arranged to exert linear forces on said first and second balance masses in opposite directions to effect said rotation of said at least one of said object tables.

19. An apparatus as in claim 18 further comprising:

respective object table bearings disposed between said at least one of said object tables and each balance mass to support said at least one of said object tables on the balance masses.

20. A lithographic projection apparatus comprising:

a radiation system which supplies a projection beam of radiation;

a first object table for holding a mask;

a second object table for holding a substrate;

an imaging projection system which images irradiated portions of the mask onto target portions of the substrate;

first and second balance masses;

a balanced object table positioning system which positions at least one of said object tables and at least partially supported by at least one of the balance masses;

a bearing, supporting each of said first and second balance masses such that they are substantially free to translate in at least a first direction; and

a respective linear actuator which directly acts between said at least one of said object tables and each of said first and second balance masses to rotate said at least one of said object tables about an axis perpendicular to said first direction, said respective actuator being arranged to exert linear forces on said first and second balance masses in opposite directions to effect said rotation of said at least one of said object tables, said actuators being constructed and arranged such that forces applied by the actuators onto said at least one of said object tables result in equal and opposite reaction forces being applied by the actuators on the balance masses.

21. A lithographic projection apparatus as in claim 20,

wherein said respective actuator has a first actuating structure connected to said first and second balance masses and a second actuating structure connected to said at least one of said object tables.