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Method for analyzing light intensity distribution

  • US 6,449,387 B1
  • Filed: 06/14/1999
  • Issued: 09/10/2002
  • Est. Priority Date: 06/15/1998
  • Status: Expired due to Fees
First Claim
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1. A method for analyzing light intensity distribution on a light exposure area where a shape of a mask pattern will be projected through an optical system by exposure light coming from a light source, said analyzing method comprising:

  • dividing said light exposure area into first areas at predetermined first intervals;

    cutting out first portions of said mask pattern which correspond to said first areas;

    sequentially determining whether transmission areas which transmit the exposure light and non-transmission areas which do not transmit the exposure light are mingled at the cut-out first portions of said mask pattern;

    calculating intensities of light which will be projected on said light exposure area, through use of the first portion of said mask pattern, when it is determined that the transmission areas and the non-transmission areas are not mingled; and

    dividing each of said first areas into second areas at second intervals smaller than said first intervals and calculating intensities of light which will be projected on said light exposure area, through use of second portions of said mask pattern which correspond to said second areas, when it is determined that the transmission areas and the non-transmission areas are mingled.

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