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Method of manufacturing an intracutaneous microneedle array

  • US 6,451,240 B1
  • Filed: 05/26/2000
  • Issued: 09/17/2002
  • Est. Priority Date: 06/09/1999
  • Status: Expired due to Term
First Claim
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1. A method of preparing a mold for manufacturing a microneedle array, comprising:

  • providing a photoresist material, in contact with a temporary substrate;

    placing a mask layer upon said photoresist material, said mask layer having a predetermined pattern, at least a portion of said mask layer comprising a material that prevents high energy radiation from passing therethrough;

    exposing said combination photoresist material/mask layer to high energy radiation;

    removing said mask layer, and chemically developing exposed portions of said photo-resist material, thereby removing portions of the photoresist material and leaving behind a pattern of said photoresist material that represents a three-dimensional structure emulating a plurality of microneedles that are to be later formed;

    electroplating said patterned photoresist material with a metallic substance; and

    detaching said metallic substance from said patterned photoresist material, said metallic substance thereby forming a microneedle array mold;

    wherein said mask layer comprises gold.

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