Deposition reactor having vaporizing, mixing and cleaning capabilities
First Claim
1. An apparatus for dispersing gases within a processing chamber, said apparatus comprising a gas distribution plate having a plurality of apertures, said apertures comprising:
- (a) an inlet surface having a circular opening coupled to a cylindrically shaped first conduit;
(b) an outlet surface having a circular opening coupled to a cylindrically shaped second conduit with a first length; and
(c) a conically shaped conduit in communication with said cylindrically shaped first and second conduits, said conically shaped conduit having walls of a second length, wherein said walls diverge toward the outlet surface and said first length is about 5.5 times larger than said second length.
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Accused Products
Abstract
An integrated deposition system is provided which is capable of vaporizing low vapor pressure liquid precursors and delivering this vapor into a processing region for use in the fabrication of advanced integrated circuits. The integrated deposition system is made up of a heated exhaust system, a remote plasma generator, a processing chamber and a liquid delivery system which together provide a commercially viable and production worthy system for depositing high capacity dielectric materials from low vapor pressure precursors, anneal those films while also providing commercially viable in-situ cleaning capability.
555 Citations
22 Claims
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1. An apparatus for dispersing gases within a processing chamber, said apparatus comprising a gas distribution plate having a plurality of apertures, said apertures comprising:
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(a) an inlet surface having a circular opening coupled to a cylindrically shaped first conduit;
(b) an outlet surface having a circular opening coupled to a cylindrically shaped second conduit with a first length; and
(c) a conically shaped conduit in communication with said cylindrically shaped first and second conduits, said conically shaped conduit having walls of a second length, wherein said walls diverge toward the outlet surface and said first length is about 5.5 times larger than said second length. - View Dependent Claims (2, 3, 4)
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5. An apparatus for distributing gases within a processing chamber, said apparatus comprising a gas distribution plate having a plurality of apertures, said apertures comprising:
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(a) a first cylindrical region having a first diameter coupled to an inlet surface of the gas distribution plate;
(b) a second cylindrical region directly coupled to an outlet surface of the gas distribution plate, said second cylindrical region having a second diameter and walls having a first length; and
(c) a conical region in communication with said first and second cylindrical regions, said conical region further comprising walls having a second length, wherein said walls diverge toward the outlet surface and said first length is at least 1.5 times as long as said second length. - View Dependent Claims (6, 7, 8, 9)
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10. A method of flowing gas through a gas distribution plate, said method comprising the steps of:
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(a) first flowing a gas through a first cylindrical region having a first diameter;
followed by(b) flowing said gas through a conical region fluidly connected to said first cylindrical region, said conical region having diverging walls with a first length, wherein said walls diverge away from said first cylindrical region;
followed by(c) flowing said gas through a second cylindrical region fluidly connected to said conical region, said second cylindrical region having a second diameter and walls of a second length, wherein said second length is at least twice as long as the length of said first length. - View Dependent Claims (11)
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12. A method for absorbing radiation within a gas distribution plate, said method comprising the steps of:
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(a) placing a substrate in a processing apparatus having a gas distribution plate wherein said gas distribution plate includes a plurality of apertures comprising an inlet with a first cylindrical region, an outlet with a second cylindrical region having a first wall length, and a conical region located between said first and second cylindrical regions, said conical region having walls of a second wall length and opening towards said second cylindrical region, wherein said first wall length is at least twice as long as said second wall length;
(b) generating radiation from said substrate wherein said radiation is incident to said gas distribution plate; and
(c) absorbing a portion of said incident radiation in said apertures. - View Dependent Claims (13, 14)
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15. A gas distribution plate for distributing gases within a process chamber, the gas distribution plate comprising an inlet surface, an outlet surface, and a plurality of apertures formed between the inlet and outlet surfaces, each aperture comprising:
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(a) a first cylindrical region having a first diameter and a first length;
(b) a second cylindrical region having a second diameter and a second length, wherein the second cylindrical region is positioned between the first cylindrical region and the outlet surface; and
(c) a conical region positioned between the first and second cylindrical regions, the conical region having walls of a third length, wherein the walls diverge toward the outlet surface and the second length is at least twice as long as the third length.
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16. A gas distribution plate for distributing gases within a process chamber, the gas distribution plate comprising an inlet surface, an outlet surface, and a plurality of apertures formed between the inlet and outlet surfaces, each aperture comprising:
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(a) a first cylindrical region directly coupled to the inlet surface, the first cylindrical region having a first diameter and a first length;
(b) a second cylindrical region directly coupled to the outlet surface, the second cylindrical region having a second diameter and a second length; and
(c) a conical region positioned between the first and second cylindrical regions, the conical region having walls of a third length, wherein the walls diverge toward the outlet surface and the second length is at least 1.5 times as long as the third length.
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17. A gas distribution plate for distributing gases within a process chamber, the gas distribution plate comprising an inlet surface, an outlet surface, and a plurality of apertures formed between the inlet and outlet surfaces, each aperture comprising:
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(a) a first cylindrical region having a first diameter and a first length;
(b) a second cylindrical region directly coupled to the outlet surface, the second cylindrical region having a second diameter and a second length; and
(c) a conical region in communication with the first and second cylindrical regions, the conical region having walls of a third length, and wherein the walls of the conical region diverge toward the outlet surface and the second length is at least 1.5 times as long as the third length.
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18. A gas distribution plate for distributing gases within a process chamber, the gas distribution plate comprising an inlet surface, an outlet surface, and a plurality of apertures formed between the inlet and outlet surfaces, each aperture comprising:
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(a) a first cylindrical region directly coupled to the inlet surface, the first cylindrical region having a first diameter and a first length;
(b) a second cylindrical region directly coupled to the outlet surface, the second cylindrical region having a second diameter and a second length;
(c) a first conical region directly coupled to the first cylindrical region; and
(d) a second conical region directly coupled to the second cylindrical region, the second conical region having walls of a third length, and wherein the second length is at least 1.5 times as long as the third length. - View Dependent Claims (19, 20, 21, 22)
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Specification