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Context-based automated defect classification system using multiple morphological masks

  • US 6,456,899 B1
  • Filed: 12/07/1999
  • Issued: 09/24/2002
  • Est. Priority Date: 12/07/1999
  • Status: Expired due to Fees
First Claim
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1. A digital computer for automatically classifying defects in a semiconductor wafer comprising:

  • means for identifying the background layers in a single reference semiconductor wafer image resulting in a layer identification image, said background layer identifying means including a background layer segmenter for dividing said reference semiconductor wafer image into different physical regions, said background layer identifying means further including a background layer classifier for classifying said physical regions of said reference semiconductor wafer image;

    means for registering a defect semiconductor wafer image to said reference semiconductor image and subsequently detecting a defect in said defect semiconductor image;

    means for classifying said detected defect using features of said defect;

    a database for storing precomputed information and sharing information between said background layer classifier and said detected defect classifying means; and

    means for associating said classified detected defect with said layer identification image resulting in a context-based classification of said defect.

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