Showerhead with reduced contact area

• US 6,461,435 B1
• Filed: 06/22/2000
• Issued: 10/08/2002
• Est. Priority Date: 06/22/2000
• Status: Expired due to Term

• Current Assignee: Applied Materials Incorporated
• Original Assignee: Applied Materials Incorporated
• Inventors: Littau, Karl A., Lu, Siqing, Jian, Ping, Vo, Bevan, Zheng, Bo, Kao, Chien-Teh, Umotoy, Salvador P., Lai, Ken Kaung, Chang, Anzhong, Trinh, Son N.
• Primary Examiner(s): Mills, Gregory
• Assistant Examiner(s): MOORE, KARLA A
• Application Number:
  US09/603,117
• Time in Patent Office: 838 Days
• Field of Search: 118/715, 118/723.E, 156/345.33, 156/345.34
• US Class Current: 118/715
• CPC Class Codes: C23C 16/455 characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
• CPC Class Codes: C23C 16/45565 Shower nozzles
• CPC Class Codes: H01J 37/3244 Gas supply means

Abstract

A showerhead for distributing gases in a semiconductor process chamber. In one embodiment, a showerhead comprising a perforated center portion, a mounting portion circumscribing the perforated center portion and a plurality of bosses extending from the mounting portion each having a hole disposed therethrough is provided. Another embodiment of the invention provides a showerhead that includes a mounting portion having a first side circumscribing a perforated center portion. A ring extends from the first side of the mounting portion. A plurality of mounting holes are disposed in the mounting portion radially to either side of the ring. The showerhead provides controlled thermal transfer between the showerhead and chamber lid resulting in less deposition on the showerhead.

Claims

1. A showerhead comprising:

a perforated center portion;

a mounting portion circumscribing said perforated center portion and having a first side;

a plurality of integral bosses extending from said first side of said mounting portion; and

a mounting hole disposed in each of said bosses.

2. The showerhead of claim 1, wherein the mounting portion is aluminum.

3. The showerhead of claim 1 further comprising:

a ring disposed on said first side of said mounting portion.

4. The showerhead of claim 1 further comprising:

a ring disposed on said first side of said mounting portion;

said ring radially position to either side of said bosses.

5. The showerhead of claim 1 further comprising:

a ring disposed on said first side of said mounting portion, said ring having an aspect ratio greater than about 0.65.

6. The showerhead of claim 1, wherein the bosses further comprise:

eight bosses disposed in a spaced-apart relation on said mounting portion.

7. The showerhead of claim 1 further comprising:

a ring disposed on said first side of said mounting portion;

said ring radially position to either side of said bosses and having an aspect ration greater than about 0.65.

8. The showerhead of claim 1 further comprising:

a surface co-planar to and circumscribing said perforated portion having a width greater than about 0.25 inches.

9. A showerhead comprising:

a perforated center portion having a first surface adapted to face a processing region;

a mounting portion circumscribing said perforated center portion having a first side facing away from the first surface of the perforated center portion;

a ring extending from said first side of said mounting portion;

a plurality of mounting holes disposed in said mounting portion radially to either side of said ring; and

a plurality of integral bosses extending from said first side of said mounting portion.

10. The showerhead of claim 9, wherein each of said mounting holes further comprise:

a boss disposed on said first side of said mounting portion having the mounting hole passing therethrough.

11. The showerhead of claim 9, wherein each of said mounting holes further comprise:

eight mounting holes positioned in a spaced-apart relation.

12. The showerhead of claim 9, wherein the mounting portion is aluminum.

13. The showerhead of claim 9, wherein the bosses are positioned a radially to either side of said ring.

14. The showerhead of claim 9, wherein the ring has an aspect ratio greater than about 0.65.

15. The showerhead of claim 9 further comprising:

a surface co-planar to and circumscribing said perforated portion having a width greater than about 0.25 inches.

16. A semiconductor process chamber comprising:

a processing chamber having a wall and a lid defining an interior volume;

a showerhead coupled to said lid and defining a plenum therebetween, said showerhead having a perforated center portion and a mounting portion circumscribing said perforated center portion;

a ring disposed between said lid and said mounting portion, said ring maintaining said lid and said mounting portion in a spaced-apart relation; and

a plurality of integral bosses extending from said first side of said mounting portion.

17. The chamber of claim 16, wherein the showerhead is aluminum.

18. The chamber of claim 16, wherein the plurality of bosses comprise eight bosses disposed in a spaced-apart relation on said mounting portion.

19. The chamber of claim 16 further comprising:

a plurality of bosses disposed on said first side of said mounting portion;

said bosses radially position to either side of said ring.

20. The chamber of claim 16, wherein the ring has an aspect ration greater than about 0.65.

21. The chamber of claim 16 further comprising:

a surface co-planar to and circumscribing said perforated portion having a width greater than about 0.25 inches.

22. The chamber of claim 16, wherein the ring is a protuberant extension of the mounting portion.