Method and apparatus for selectively programming a semiconductor device
First Claim
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1. A method of programming a semiconductor device, the method comprising the steps of:
- creating an array of fuses for enabling or disabling functionality of the semiconductor device depending on whether the fuse is removed or intact;
forming a layer of photoresist over each one of the fuses;
removing the photoresist from a predetermined set of the fuses; and
removing the predetermined set of fuses.
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Abstract
A method of programming a conductive semiconductor device having a plurality of conductive links by selective removal of all or portions of the conductive link using photolithographic and subtractive etching. Removal of only pre-selected conductive links is accomplished by use of a programmable array shutter to expose photoresist only above the conductive links to be removed.
22 Citations
6 Claims
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1. A method of programming a semiconductor device, the method comprising the steps of:
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creating an array of fuses for enabling or disabling functionality of the semiconductor device depending on whether the fuse is removed or intact;
forming a layer of photoresist over each one of the fuses;
removing the photoresist from a predetermined set of the fuses; and
removing the predetermined set of fuses. - View Dependent Claims (2, 3)
etching the predetermined set of fuses.
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3. The method of claim 2 wherein the step of removing the photoresist from a predetermined set of the fuses includes the steps of:
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exposing the photoresist from a predetermined set of the fuses; and
developing the exposed photoresist.
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4. A method of programming a semiconductor device having a plurality of fuses for enabling or disabling functionality of the semiconductor device, the method comprising the steps of:
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forming a layer of photoresist over each one of the fuses;
removing the photoresist from a predetermined set of the fuses; and
removing the predetermined set of fuses, thereby changing the functionality of the semiconductor device. - View Dependent Claims (5, 6)
etching the predetermined set of fuses.
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6. The method of claim 5 wherein the step of removing the photoresist from a predetermined set of the fuses includes the steps of:
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exposing the photoresist from a predetermined set of the fuses; and
developing the exposed photoresist.
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Specification