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Antireflection film

  • US 6,464,822 B1
  • Filed: 02/19/1998
  • Issued: 10/15/2002
  • Est. Priority Date: 02/19/1998
  • Status: Expired due to Term
First Claim
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1. A process for providing an antireflection film on a substrate, the process comprising:

  • depositing an inorganic antireflection layer on the substrate;

    depositing a layer of a curable composition on the inorganic antireflection layer; and

    effecting free radical curing of the deposited curable composition to form an optically active polymer layer having a thickness of from approximately 20 to approximately 200 nm and a refractive index not greater than approximately 1.53 over the wavelength range of 400 to 700 nm.

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