Imager structure

• US 6,465,824 B1
• Filed: 03/09/2000
• Issued: 10/15/2002
• Est. Priority Date: 03/09/2000
• Status: Expired due to Fees

• Current Assignee: General Electric Company
• Original Assignee: General Electric Company
• Inventors: Liu, Jianqiang, Possin, George Edward, Kwasnick, Robert Forrest
• Primary Examiner(s): Lee, Eddie
• Assistant Examiner(s): NGUYEN, JOSEPH H
• Application Number:
  US09/522,231
• Time in Patent Office: 950 Days
• Field of Search: 257/290, 257/291, 257/233, 257/459, 257/292, 257/449, 257/458, 257/59, 257/72, 250/308.08, 250/208
• US Class Current: 257/290
• CPC Class Codes: H01L 27/14603 Special geometry or disposition of pixel-elements, address-lines or gate-electrodes
• CPC Class Codes: H01L 31/022408 for devices characterised by at least one potential jump barrier or surface barrier

Abstract

In an imager having an array of light-sensitive elements and employing striped common electrodes, exposed edges of preimidized polyimide layers above the light-sensitive imaging elements are sealed with the material of the common electrode (e.g., indium tin oxide). Similarly, exposed preimidized polyimide edges in electrical contacts for the array and bridge members electrically coupling adjacent light-sensitive imaging elements are also sealed with the material of the common electrode.

Claims

1. A structure for an imager, comprising:

a substrate;

at least one data line disposed on said substrate;

an organic dielectric layer; and

a common electrode, said common electrode comprising a light-transmissive conductive layer covering said organic dielectric layer and extending beyond an exposed edge of said organic dielectric layer along a striped segment of said common electrode;

wherein said striped segment does not overlie said at least one data line.

2. The structure of claim 1, wherein the organic dielectric layer comprises polyimide.

3. The structure of claim 2, wherein said common electrode comprises a plurality of striped segments.

4. The structure of claim 3, wherein said exposed edges of said organic dielectric layer are disposed along said plurality of striped segments of said common electrode.

5. The structure of claim 4, wherein the light-transmissive conductive oxide comprises indium tin oxide.

6. The structure of claim 1, wherein the light-transmissive conductive layer extends at least about one micron beyond the exposed edge.

7. The structure of claim 6, wherein light-transmissive conductive layer extends between about one micron and about five microns beyond the exposed edge.

8. An imager comprising:

a substrate;

a plurality of data lines disposed on said substrate;

at least one electrical contact within said imager, said at least one electrical contact comprising a first layer of conductive material and a common electrode, said common electrode comprising a second layer of light-transmissive conductive material;

an organic dielectric layer situated between portions of said first layer of conductive material and said second layer of light-transmissive conductive material;

an organic dielectric layer situated between portions of said first layer of conductive material and second layer of light-transmissive conductive material; and

a via region to provide electrical contact between said first layer of conductive material such that said second layer of light-transmissive conductive material is disposed in electrical contact with said first layer of conductive material, said organic dielectric being removed from at least one portion of said imager on a side of said via region;

said common electrode comprising a plurality of striped segments, wherein said plurality of striped segments do not overlie said plurality of data lines;

said second layer of light-transmissive conductive material being disposed to extend at least about one micron beyond an exposed edge of said organic dielectric layer in said via region and along said striped segments of said common electrode.

9. The imager of claim 8, wherein the layer of light-transmissive conductive material extends between about one micron and about five microns beyond the exposed edge of said organic dielectric layer.

10. The imager of claim 8, further comprising an array of light-sensitive imaging elements, said common electrode being disposed in electrical contact with each light-sensitive imaging element in said array.

11. The imager of claim 10, wherein said plurality of striped segments comprise segments disposed generally parallel to said plurality of data lines in said array and a plurality of bridge segments disposed generally perpendicular to said data lines.

12. The imager of claim 11, wherein said organic dielectric layer is terminated along each of said plurality of common electrode striped segments.

13. The imager of claim 12, wherein said common electrode further is disposed so as to be in electrical contact with each of said light sensitive imaging elements.

14. The imager of claim 10, wherein the at least one contact provides electrical coupling of the array to circuitry outside the array.

15. The imager of claim 8, wherein the organic dielectric layer comprises polyimide.

16. The imager of claim 15, wherein the polyimide comprises preimidized polyimide.

17. The imager of claim 8, wherein the light-transmissive conductive material comprises a light-transmissive conductive oxide.

18. The imager of claim 17, wherein the light-transmissive conductive oxide comprises indium tin oxide.

19. The imager of claim 8, wherein the layer of light-transmissive conductive material extends between about one micron and about five microns beyond the exposed edge.