Method and system for reticle inspection by photolithography simulation
First Claim
1. A system for automatic optical inspection of a photolithography substrate to be used in a selected photolithography exposure tool operating with a selected frequency of light and a selected numerical aperture and coherence of the light, and using a selected type of resist, the system comprising:
- a light source providing a light beam;
a scanning apparatus receiving the light beam and scanning the light beam to form a flying spot over the substrate;
an objective optics having a defined numerical aperture;
an illumination assembly operative to adjust said defined numerical aperture to simulate said selected numerical aperture of the exposure tool;
a light sensor receiving light transmitted through the substrate and generating data representative thereof, and, a processor unit coupled to light sensor to be responsive to said data for analyzing it and generating data indicative of defects on the substrate.
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Accused Products
Abstract
A system and method are presented for optical inspection of reticles by simulating the operation of a selected stepper. The system utilizes a flying spot inspection technique and includes a scanning apparatus and a detection unit. The scanning apparatus uses a laser source similar to that of the stepper of interest. First and second light directing assemblies are accommodated in the optical paths of, respectively, incident and transmitted light, and are designed so as to provide coherence of the light substantially equal to that of the stepper.
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Citations
17 Claims
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1. A system for automatic optical inspection of a photolithography substrate to be used in a selected photolithography exposure tool operating with a selected frequency of light and a selected numerical aperture and coherence of the light, and using a selected type of resist, the system comprising:
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a light source providing a light beam;
a scanning apparatus receiving the light beam and scanning the light beam to form a flying spot over the substrate;
an objective optics having a defined numerical aperture;
an illumination assembly operative to adjust said defined numerical aperture to simulate said selected numerical aperture of the exposure tool;
a light sensor receiving light transmitted through the substrate and generating data representative thereof, and, a processor unit coupled to light sensor to be responsive to said data for analyzing it and generating data indicative of defects on the substrate. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17)
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Specification