Method and system for reticle inspection by photolithography simulation

• US 6,466,315 B1
• Filed: 09/03/1999
• Issued: 10/15/2002
• Est. Priority Date: 09/03/1999
• Status: Expired due to Term

• Current Assignee: Applied Materials Incorporated
• Original Assignee: Applied Materials Incorporated
• Inventors: Kenan, Boaz, Karpol, Avner
• Primary Examiner(s): Rosenberger, Richard A.
• Application Number:
  US09/390,503
• Time in Patent Office: 1,138 Days
• Field of Search: 356/237.2, 356/237.3, 356/237.4, 356/237.5
• US Class Current: 356/237.4
• CPC Class Codes: G01N 21/95607 using a comparative method
• CPC Class Codes: G03F 1/84 Inspecting
• CPC Class Codes: G03F 7/70125 Use of illumination settings tailored to particular mask patterns details of setting means G03F7/70091
• CPC Class Codes: G03F 7/70358 Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging
• CPC Class Codes: G03F 7/705 Modelling or simulating from physical phenomena up to complete wafer processes or whole workflow in wafer productions
• CPC Class Codes: G03F 7/70591 Testing optical components
• CPC Class Codes: G03F 7/70666 Aerial image, i.e. measuring the image of the patterned exposure light at the image plane of the projection system

Abstract

A system and method are presented for optical inspection of reticles by simulating the operation of a selected stepper. The system utilizes a flying spot inspection technique and includes a scanning apparatus and a detection unit. The scanning apparatus uses a laser source similar to that of the stepper of interest. First and second light directing assemblies are accommodated in the optical paths of, respectively, incident and transmitted light, and are designed so as to provide coherence of the light substantially equal to that of the stepper.

Claims

1. A system for automatic optical inspection of a photolithography substrate to be used in a selected photolithography exposure tool operating with a selected frequency of light and a selected numerical aperture and coherence of the light, and using a selected type of resist, the system comprising:

a light source providing a light beam;

a scanning apparatus receiving the light beam and scanning the light beam to form a flying spot over the substrate;

an objective optics having a defined numerical aperture;

an illumination assembly operative to adjust said defined numerical aperture to simulate said selected numerical aperture of the exposure tool;

a light sensor receiving light transmitted through the substrate and generating data representative thereof, and,

a processor unit coupled to light sensor to be responsive to said data for analyzing it and generating data indicative of defects on the substrate.

2. The system according to claim 1, wherein said light source comprises a continuous UV Laser.

3. The system according to claim 2, wherein said continuous UV laser is one of a doubled Argon or frequency doled and parametrically mixed solid state laser.

4. The system according to claim 1, further comprising an optical beam coherence reducer.

5. The system according to claim 1, wherein said illumination assembly comprises an illumination aperture for adjusting the said defined numerical aperture;

and further comprising a collection assembly comprising a collection aperture for adjusting collection numerical aperture of propagation of the transmitted light.

6. The system according to claim 5, wherein said illumination aperture comprises an off-axis aperture.

7. The system according to claim 5, wherein said illumination aperture comprises a set of several different apertures for selectively inserting one of these apertures into the optical path of the incident light beam.

8. The system according to claim 5, wherein said illumination aperture comprises a beam shaper that changes a Gaussian profile of the laser beam to a flat-top profile.

9. The system according to claim 8, wherein said beam shaper is a diffractive optical element.

10. The system according to claim 1, wherein said detection unit comprises a photomultiplier tube accommodated so as to receive said transmitted light components.

11. The system according to claim 1, further comprising a second light sensor receiving light components reflected from the spot on the substrate and generates data representative thereof which is received and analyzed at the processor unit.

12. The system according to claim 11, wherein said second light sensor is a photomultiplier tube.

13. The system according to claim 1, further comprising a dark field light sensor receiving light components scattered from the spot on the reticle and generating data representative thereof which is received and analyzed at the processor unit.

14. The system according to claim 13, wherein said dark field light sensor is a photomultiplier tube.

15. The system according to claim 1, wherein said scanning apparatus comprises a beam splitting arrangement for splitting the generated light beam into at least 10 two spatially separated incident light beams, the system operating in an multispot scanning mode.

16. The system according to claim 1, further comprising:

a condenser lens situated between said substrate and said light sensor; and

aperture assembly for adjusting the effective numerical aperture of said condenser lens.

17. The system of claim 16, wherein said aperture assembly comprises a plurality of apertures selectable for adjusting the effective numerical aperture.