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Reactor chamber for an externally excited torroidal plasma source with a gas distribution plate

  • US 6,468,388 B1
  • Filed: 08/11/2000
  • Issued: 10/22/2002
  • Est. Priority Date: 08/11/2000
  • Status: Expired due to Fees
First Claim
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1. A plasma chamber defining an evacuated interior environment for processing a substrate, said chamber comprising:

  • a substrate support;

    an apertured gas distribution plate in spaced facing relationship to the substrate support, and adapted to flow process gases into the chamber interior environment adjacent the substrate support, said gas distribution plate and substrate support defining a substrate processing region therebetween;

    a hollow conduit having respective ends opening into said substrate processing region on opposite sides of said gas distribution plate, with the interior of said conduit sharing the interior environment;

    a side wall surrounding said processing region between said gas distribution plate and said substrate support;

    said conduit being adapted to accept irradiation by an RF field of processing gases within the conduit to sustain a plasma in a reentrant path extending around the conduit interior and across the substrate processing region within said chamber interior environment, said path being bounded by said side wall.

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