Measurement of waveplate retardation using a photoelastic modulator

• US 6,473,181 B1
• Filed: 01/21/2000
• Issued: 10/29/2002
• Est. Priority Date: 07/28/1997
• Status: Expired due to Term

• Current Assignee: Hinds Instruments, Inc.
• Original Assignee: Hinds Instruments, Inc.
• Inventors: Oakberg, Theodore C.
• Primary Examiner(s): STAFIRA, MICHAEL PATRICK
• Application Number:
  US09/463,532
• Time in Patent Office: 1,012 Days
• Field of Search: 356/364, 356/365, 356/366, 356/367, 356/368, 356/382, 356/450, 356/453, 356/491, 250/225, 250/226
• US Class Current: 356/365
• CPC Class Codes: G01N 21/23 Bi-refringence

Abstract

A practical system and method for measuring waveplate retardation. The system employs a photoelastic modulator (22) in an optical setup and provides high sensitivity. The analysis is particularly appropriate for quality-control testing of waveplates (26). The system is also adaptable for slightly varying the retardation provided by a waveplate (26) or any other retarder device in a given optical setup. To this end, the waveplate (26) position may be precisely altered to introduce correspondingly precise adjustments of the retardation values that the waveplate (26) provides. The system is further refined to permit one to compensate for errors in the retardation measurements just mentioned. Such errors may be attributable to static birefringence present in the optical element of the photoelastic modulator (22) that is incorporated in the system.

Claims

1. An apparatus for measuring retardation induced by a subject optical element that exhibits birefringence, comprising:

a source of polarized light arranged such that the light propagates along a path from the source;

a light detector located in the path substantially opposite the source;

a photoelastic modulator located in the path between the source and detector such that the light propagates through part of the photoelastic modulator, wherein the photoelastic modulator exhibits static birefringence,

a compensating optical element rotatably mounted between the photoelastic modulator and the subject optical element and adjustable to compensate for the static retardation of the photoelastic modulator; and

the subject optical element being rotatably mounted in the path so that the light propagating through the part of the photoelastic modulator propagates through the subject optical element to be incident on the light detector, wherein the retardation of the subject optical element correlates to the intensity of the light that is incident on the detector, and whereby the detector produces an output signal indicative of the intensity.

2. The apparatus of claim 1 comprising means for processing the detector output signal to provide a measure of the retardation of the subject optical element and to compare the measured retardation with a predetermined retardation associated with the subject optical element.

3. The apparatus of claim 2 wherein the subject optical element is a waveplate.

4. The apparatus of claim 1 including means for mounting the compensating optical element in the optical path for selectively tilting the compensating optical element.

5. A method of operating an optical system for measuring retardation induced by a subject optical element, comprising the steps of:

rotatably mounting the subject optical element in a path of polarized light that emanates from a source;

locating a photoelastic modulator in the path between the source and the subject optical element such that the light propagates through the photoelastic modulator and through the subject optical element;

controlling the photoelastic modulator to induce retardation into the light passing through it;

processing the light that passes through the subject optical element to determine the difference between the retardation induced by the subject optical element and that induced by the photoelastic modulator; and

compensating for static retardation present in the photoelastic modulator by introducing a rotatably mounted compensating optical element into the system between the photoelastic modulator and the subject optical element.

6. The method of claim 5 wherein the compensating step includes the step of selectively tilting the compensating optical element that is introduced into the system between the photoelastic modulator and the subject optical element optical element.

7. The method of claim 5 wherein the introducing step includes introducing a half-waveplate as the compensating optical element and accounting for the polarization effects of the half waveplate.

8. The method of claim 5 wherein the introducing step includes introducing a full-waveplate as the compensating optical element.